Plasma device

A plasma device includes a hollow chamber casing, at least one hollow electrode tube, and an intermediate frequency plasma power supply. The hollow chamber casing has a chamber. The at least one hollow electrode tube is disposed within the chamber, in which a tube wall of the at least one hollow ele...

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Bibliographische Detailangaben
Hauptverfasser:	CHEN, ZHAONG, CHANG, YUI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A plasma device includes a hollow chamber casing, at least one hollow electrode tube, and an intermediate frequency plasma power supply. The hollow chamber casing has a chamber. The at least one hollow electrode tube is disposed within the chamber, in which a tube wall of the at least one hollow electrode tube is provided with several holes. The intermediate frequency plasma power supply has a first potential terminal and a second potential terminal. The first potential terminal and the second potential terminal have different potentials. The first potential terminal and the second potential terminal are respectively connected to the hollow chamber casing and the at least one hollow electrode tube.