Semiconductor memory device and method of manufacturing the same

Provided are a semiconductor memory device and a method of manufacturing a semiconductor memory device. The semiconductor memory device including an active pattern defined by a device isolation pattern, a bit line extending in a first direction on the device isolation pattern and the active pattern, a bit line capping pattern including a first capping pattern, a second capping pattern, and a third capping pattern sequentially stacked on an upper surface of the bit line, and a shield pattern covering one side of the bit line may be provided. An upper surface of the shield pattern may be at a height lower than an upper surface of the first capping pattern.