Method and system for critical dimension metrology

A system and methods for OCD metrology are provided including receiving reference parameters, receiving multiple sets of measured scatterometric data, and receiving an optical model designed to generate one or more sets of model scatterometric data according to a set of pattern parameters, and train...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SHLAGMAN, OFER, YACOBY, RAN, BRINGOLTZ, BARAK, STURLESI, BOAZ
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CALCULATING COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING PHYSICS
Online-Zugang:	Volltext bestellen
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