Substrate processing liquid, substrate processing method and substrate processing apparatus

The present invention provides a substrate processing liquid which is suitable for a substrate having a layer to be etched, wherein at least one of the bottom wall and the side wall of a trench structure is configured from a metal or a compound of the metal. This substrate processing liquid comprise...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HARUMOTO, AKIKO, HANAWA, YOSUKE, UEDA, DAI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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