Facility for treating gas comprising a gas cooling apparatus

A facility for treating gas comprising a gas cooling apparatus is provided. According to an embodiment of the invention, there is provided a facility for treating gas 1, comprising a flow channel 100 providing a passage through which a waste gas flows; a thermal decomposition unit 200 for thermally...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SHIN, HYUN-A, CHA, CHUN-LOON, CHOI, YUN-SOO, LEE, JEONG-KEUN, KIM, JU-HA, KO, CHAN-KYOO, LEE, PIL-HYONG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEMICONDUCTOR DEVICES SEPARATION TRANSPORTING
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