Methods, systems, and apparatus for conducting a radical treatment operation prior to conducting an annealing operation

Aspects of the present disclosure relate to methods, systems, and apparatus for conducting a radical treatment operation on a substrate prior to conducting an annealing operation on the substrate. In one implementation, a method of processing semiconductor substrates includes pre-heating a substrate...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: SAMPATH KUMAR, PRADEEP, KAMP, MICHAEL P, TAM, NORMAN L, IU, DONGMING, RIESKE, ERIC R, SHARMA, SHASHANK
Format: Patent
Sprache:chi ; eng
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