Substrate support assembly and plasma processing apparatus
A substrate support assembly includes: a base including a flow path for a temperature control medium; a substrate support including an electrode plate installed on the base and an electrostatic chuck installed on the electrode plate, and configured to support a substrate; a heater configured to heat...
Gespeichert in:
Hauptverfasser: | , , |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Schreiben Sie den ersten Kommentar!