Substrate support assembly and plasma processing apparatus

A substrate support assembly includes: a base including a flow path for a temperature control medium; a substrate support including an electrode plate installed on the base and an electrostatic chuck installed on the electrode plate, and configured to support a substrate; a heater configured to heat...

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Bibliographische Detailangaben
Hauptverfasser: KOIWA, SHINGO, AHIKO, YUKI, KUDO, YASUHISA
Format: Patent
Sprache:chi ; eng
Schlagworte:
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