Negative photosensitive polymer, polymer solution, negative photosensitive resin composition, cured film and semiconductor device

A negative photosensitive polymer according to the present invention is solvent-soluble, includes a structural unit containing an imide ring, and comprises a group represented by general formula (t) on at least one of both termini. The average value of a positive charge ([delta]+) of two carbonyl ca...

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Bibliographische Detailangaben
Hauptverfasser:	IMAI, KEITA, OTOGURO, AKIHIKO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	A negative photosensitive polymer according to the present invention is solvent-soluble, includes a structural unit containing an imide ring, and comprises a group represented by general formula (t) on at least one of both termini. The average value of a positive charge ([delta]+) of two carbonyl carbons of the imide ring, as calculated using a charge equilibration method, is 0.095 or less.