Plasma processing apparatus and plasma processing method

A plasma processing apparatus includes a plasma processing chamber, a substrate support disposed in the plasma processing chamber, an annular baffle plate disposed so as to surround the substrate support, the annular baffle plate having a plurality of openings, a first annular plate disposed below t...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	JIN, WAN-SUNG, HOSAKA, YUKI, JUNG, HWA-JUN, OHATA, MITSUNORI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
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