Control device, adjustment method, lithography device, and method for manufacturing article

The present invention is a control device that generates a control signal for controlling a control object, said control device comprising: a first compensator that generates a first signal on the basis of the control deviation of the control object; a corrector that corrects the control deviation u...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	ISHII, YUJI, ITO, MASAHIRO, MORIKAWA, HIROSHI, HATA, TOMOYASU, KUSAYANAGI, HIROKAZU, HASHIMOTO, TAKUMI, INOMATA, YUUYA, ASAKURA, YASUNOBU
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY CONTROL OR REGULATING SYSTEMS IN GENERAL CONTROLLING ELECTROGRAPHY FUNCTIONAL ELEMENTS OF SUCH SYSTEMS HOLOGRAPHY MATERIALS THEREFOR MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS REGULATING
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Beschreibung
Zusammenfassung:	The present invention is a control device that generates a control signal for controlling a control object, said control device comprising: a first compensator that generates a first signal on the basis of the control deviation of the control object; a corrector that corrects the control deviation using one adjustment unit among a plurality of adjustment units that generate a correction signal by correcting the control deviation according to a calculation formula with which a coefficient can be adjusted; a second compensator that generates a second signal using a neural network, on the basis of the correction signal; and a calculation unit that generates the control signal on the basis of the first signal and the second signal.