Processing system and extraction assembly including high angle extraction optics

A processing system may include a plasma chamber operable to generate a plasma, and an extraction assembly, arranged along a side of the plasma chamber. The extraction assembly may include an extraction plate including an extraction aperture, the extraction plate having a non-planar shape, and gener...

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Hauptverfasser: TEFERI, MINAB B, DANIELS, KEVIN M, SINCLAIR, FRANK, KURUNCZI, PETER F, OLSON, JOSEPH C, CAMPBELL, CHRISTOPHER, RYAN, KEVIN T, BILOIU, COSTEL, WALLACE, JAY R
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creator TEFERI, MINAB B
DANIELS, KEVIN M
SINCLAIR, FRANK
KURUNCZI, PETER F
OLSON, JOSEPH C
CAMPBELL, CHRISTOPHER
RYAN, KEVIN T
BILOIU, COSTEL
WALLACE, JAY R
description A processing system may include a plasma chamber operable to generate a plasma, and an extraction assembly, arranged along a side of the plasma chamber. The extraction assembly may include an extraction plate including an extraction aperture, the extraction plate having a non-planar shape, and generating an extracted ion beam at a high angle of incidence with respect to a perpendicular to a plane of a substrate, when the plane of the substrate is arranged parallel to the side of the plasma chamber.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TW202217898A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TW202217898A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TW202217898A3</originalsourceid><addsrcrecordid>eNrjZAgIKMpPTi0uzsxLVyiuLC5JzVVIzEtRSK0oKUpMLsnMz1NILC5OzU3KqVTIzEvOKU0BKczITM8AKkvPSUVWmF9QkplczMPAmpaYU5zKC6W5GRTdXEOcPXRTC_LjU4sLEpNT81JL4kPCjQyMjAzNLSwtHI2JUQMADWU4Zg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Processing system and extraction assembly including high angle extraction optics</title><source>esp@cenet</source><creator>TEFERI, MINAB B ; DANIELS, KEVIN M ; SINCLAIR, FRANK ; KURUNCZI, PETER F ; OLSON, JOSEPH C ; CAMPBELL, CHRISTOPHER ; RYAN, KEVIN T ; BILOIU, COSTEL ; WALLACE, JAY R</creator><creatorcontrib>TEFERI, MINAB B ; DANIELS, KEVIN M ; SINCLAIR, FRANK ; KURUNCZI, PETER F ; OLSON, JOSEPH C ; CAMPBELL, CHRISTOPHER ; RYAN, KEVIN T ; BILOIU, COSTEL ; WALLACE, JAY R</creatorcontrib><description>A processing system may include a plasma chamber operable to generate a plasma, and an extraction assembly, arranged along a side of the plasma chamber. The extraction assembly may include an extraction plate including an extraction aperture, the extraction plate having a non-planar shape, and generating an extracted ion beam at a high angle of incidence with respect to a perpendicular to a plane of a substrate, when the plane of the substrate is arranged parallel to the side of the plasma chamber.</description><language>chi ; eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20220501&amp;DB=EPODOC&amp;CC=TW&amp;NR=202217898A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20220501&amp;DB=EPODOC&amp;CC=TW&amp;NR=202217898A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TEFERI, MINAB B</creatorcontrib><creatorcontrib>DANIELS, KEVIN M</creatorcontrib><creatorcontrib>SINCLAIR, FRANK</creatorcontrib><creatorcontrib>KURUNCZI, PETER F</creatorcontrib><creatorcontrib>OLSON, JOSEPH C</creatorcontrib><creatorcontrib>CAMPBELL, CHRISTOPHER</creatorcontrib><creatorcontrib>RYAN, KEVIN T</creatorcontrib><creatorcontrib>BILOIU, COSTEL</creatorcontrib><creatorcontrib>WALLACE, JAY R</creatorcontrib><title>Processing system and extraction assembly including high angle extraction optics</title><description>A processing system may include a plasma chamber operable to generate a plasma, and an extraction assembly, arranged along a side of the plasma chamber. The extraction assembly may include an extraction plate including an extraction aperture, the extraction plate having a non-planar shape, and generating an extracted ion beam at a high angle of incidence with respect to a perpendicular to a plane of a substrate, when the plane of the substrate is arranged parallel to the side of the plasma chamber.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZAgIKMpPTi0uzsxLVyiuLC5JzVVIzEtRSK0oKUpMLsnMz1NILC5OzU3KqVTIzEvOKU0BKczITM8AKkvPSUVWmF9QkplczMPAmpaYU5zKC6W5GRTdXEOcPXRTC_LjU4sLEpNT81JL4kPCjQyMjAzNLSwtHI2JUQMADWU4Zg</recordid><startdate>20220501</startdate><enddate>20220501</enddate><creator>TEFERI, MINAB B</creator><creator>DANIELS, KEVIN M</creator><creator>SINCLAIR, FRANK</creator><creator>KURUNCZI, PETER F</creator><creator>OLSON, JOSEPH C</creator><creator>CAMPBELL, CHRISTOPHER</creator><creator>RYAN, KEVIN T</creator><creator>BILOIU, COSTEL</creator><creator>WALLACE, JAY R</creator><scope>EVB</scope></search><sort><creationdate>20220501</creationdate><title>Processing system and extraction assembly including high angle extraction optics</title><author>TEFERI, MINAB B ; DANIELS, KEVIN M ; SINCLAIR, FRANK ; KURUNCZI, PETER F ; OLSON, JOSEPH C ; CAMPBELL, CHRISTOPHER ; RYAN, KEVIN T ; BILOIU, COSTEL ; WALLACE, JAY R</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TW202217898A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2022</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><toplevel>online_resources</toplevel><creatorcontrib>TEFERI, MINAB B</creatorcontrib><creatorcontrib>DANIELS, KEVIN M</creatorcontrib><creatorcontrib>SINCLAIR, FRANK</creatorcontrib><creatorcontrib>KURUNCZI, PETER F</creatorcontrib><creatorcontrib>OLSON, JOSEPH C</creatorcontrib><creatorcontrib>CAMPBELL, CHRISTOPHER</creatorcontrib><creatorcontrib>RYAN, KEVIN T</creatorcontrib><creatorcontrib>BILOIU, COSTEL</creatorcontrib><creatorcontrib>WALLACE, JAY R</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TEFERI, MINAB B</au><au>DANIELS, KEVIN M</au><au>SINCLAIR, FRANK</au><au>KURUNCZI, PETER F</au><au>OLSON, JOSEPH C</au><au>CAMPBELL, CHRISTOPHER</au><au>RYAN, KEVIN T</au><au>BILOIU, COSTEL</au><au>WALLACE, JAY R</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Processing system and extraction assembly including high angle extraction optics</title><date>2022-05-01</date><risdate>2022</risdate><abstract>A processing system may include a plasma chamber operable to generate a plasma, and an extraction assembly, arranged along a side of the plasma chamber. The extraction assembly may include an extraction plate including an extraction aperture, the extraction plate having a non-planar shape, and generating an extracted ion beam at a high angle of incidence with respect to a perpendicular to a plane of a substrate, when the plane of the substrate is arranged parallel to the side of the plasma chamber.</abstract><oa>free_for_read</oa></addata></record>
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language chi ; eng
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
title Processing system and extraction assembly including high angle extraction optics
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-25T01%3A56%3A25IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=TEFERI,%20MINAB%20B&rft.date=2022-05-01&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ETW202217898A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true