Processing system and extraction assembly including high angle extraction optics

Processing system and extraction assembly including high angle extraction optics

A processing system may include a plasma chamber operable to generate a plasma, and an extraction assembly, arranged along a side of the plasma chamber. The extraction assembly may include an extraction plate including an extraction aperture, the extraction plate having a non-planar shape, and gener...

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Bibliographische Detailangaben
Hauptverfasser: TEFERI, MINAB B, DANIELS, KEVIN M, SINCLAIR, FRANK, KURUNCZI, PETER F, OLSON, JOSEPH C, CAMPBELL, CHRISTOPHER, RYAN, KEVIN T, BILOIU, COSTEL, WALLACE, JAY R
Format: Patent
Sprache:chi ; eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Beschreibung
Zusammenfassung:A processing system may include a plasma chamber operable to generate a plasma, and an extraction assembly, arranged along a side of the plasma chamber. The extraction assembly may include an extraction plate including an extraction aperture, the extraction plate having a non-planar shape, and generating an extracted ion beam at a high angle of incidence with respect to a perpendicular to a plane of a substrate, when the plane of the substrate is arranged parallel to the side of the plasma chamber.