Polishing material, composition for polishing, and polishing method

Provided are: a polishing material which is capable of removing rolling of the outer surface of a resin coating film by polishing and is not susceptible to the formation of polishing scratches; a composition for polishing; and a polishing method. This composition for polishing contains a polishing m...

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Hauptverfasser: YAMADA, EIICHI, TAMAI, KAZUSEI
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Sprache:chi ; eng
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creator YAMADA, EIICHI
TAMAI, KAZUSEI
description Provided are: a polishing material which is capable of removing rolling of the outer surface of a resin coating film by polishing and is not susceptible to the formation of polishing scratches; a composition for polishing; and a polishing method. This composition for polishing contains a polishing material which is composed of aluminum oxide particles having a specific surface area of from 5 m2/g to 50 m2/g (inclusive) and an average secondary particle diameter of from 0.05 [mu]m to 4.8 [mu]m (inclusive). This composition for polishing is used for polishing of the outer surface of a resin coating film.
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This composition for polishing contains a polishing material which is composed of aluminum oxide particles having a specific surface area of from 5 m2/g to 50 m2/g (inclusive) and an average secondary particle diameter of from 0.05 [mu]m to 4.8 [mu]m (inclusive). 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language chi ; eng
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subjects ADHESIVES
APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
CHEMISTRY
DRESSING OR CONDITIONING OF ABRADING SURFACES
DYES
FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
GRINDING
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
PAINTS
PERFORMING OPERATIONS
POLISHES
POLISHING
POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH
PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL
SKI WAXES
SPRAYING OR ATOMISING IN GENERAL
TRANSPORTING
title Polishing material, composition for polishing, and polishing method
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