Polishing material, composition for polishing, and polishing method
Provided are: a polishing material which is capable of removing rolling of the outer surface of a resin coating film by polishing and is not susceptible to the formation of polishing scratches; a composition for polishing; and a polishing method. This composition for polishing contains a polishing m...
Gespeichert in:
Hauptverfasser: | , |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | YAMADA, EIICHI TAMAI, KAZUSEI |
description | Provided are: a polishing material which is capable of removing rolling of the outer surface of a resin coating film by polishing and is not susceptible to the formation of polishing scratches; a composition for polishing; and a polishing method. This composition for polishing contains a polishing material which is composed of aluminum oxide particles having a specific surface area of from 5 m2/g to 50 m2/g (inclusive) and an average secondary particle diameter of from 0.05 [mu]m to 4.8 [mu]m (inclusive). This composition for polishing is used for polishing of the outer surface of a resin coating film. |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TW202216947A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TW202216947A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TW202216947A3</originalsourceid><addsrcrecordid>eNrjZHAOyM_JLM7IzEtXyE0sSS3KTMzRUUjOzy3IL84syczPU0jLL1IogKnRUUjMS0FwFXJTSzLyU3gYWNMSc4pTeaE0N4Oim2uIs4duakF-fGpxQWJyal5qSXxIuJGBkZGhmaWJuaMxMWoAoLYy3Q</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Polishing material, composition for polishing, and polishing method</title><source>esp@cenet</source><creator>YAMADA, EIICHI ; TAMAI, KAZUSEI</creator><creatorcontrib>YAMADA, EIICHI ; TAMAI, KAZUSEI</creatorcontrib><description>Provided are: a polishing material which is capable of removing rolling of the outer surface of a resin coating film by polishing and is not susceptible to the formation of polishing scratches; a composition for polishing; and a polishing method. This composition for polishing contains a polishing material which is composed of aluminum oxide particles having a specific surface area of from 5 m2/g to 50 m2/g (inclusive) and an average secondary particle diameter of from 0.05 [mu]m to 4.8 [mu]m (inclusive). This composition for polishing is used for polishing of the outer surface of a resin coating film.</description><language>chi ; eng</language><subject>ADHESIVES ; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ; CHEMISTRY ; DRESSING OR CONDITIONING OF ABRADING SURFACES ; DYES ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; GRINDING ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; PAINTS ; PERFORMING OPERATIONS ; POLISHES ; POLISHING ; POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH ; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL ; SKI WAXES ; SPRAYING OR ATOMISING IN GENERAL ; TRANSPORTING</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220501&DB=EPODOC&CC=TW&NR=202216947A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220501&DB=EPODOC&CC=TW&NR=202216947A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YAMADA, EIICHI</creatorcontrib><creatorcontrib>TAMAI, KAZUSEI</creatorcontrib><title>Polishing material, composition for polishing, and polishing method</title><description>Provided are: a polishing material which is capable of removing rolling of the outer surface of a resin coating film by polishing and is not susceptible to the formation of polishing scratches; a composition for polishing; and a polishing method. This composition for polishing contains a polishing material which is composed of aluminum oxide particles having a specific surface area of from 5 m2/g to 50 m2/g (inclusive) and an average secondary particle diameter of from 0.05 [mu]m to 4.8 [mu]m (inclusive). This composition for polishing is used for polishing of the outer surface of a resin coating film.</description><subject>ADHESIVES</subject><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</subject><subject>CHEMISTRY</subject><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES</subject><subject>DYES</subject><subject>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</subject><subject>GRINDING</subject><subject>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</subject><subject>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>PAINTS</subject><subject>PERFORMING OPERATIONS</subject><subject>POLISHES</subject><subject>POLISHING</subject><subject>POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH</subject><subject>PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</subject><subject>SKI WAXES</subject><subject>SPRAYING OR ATOMISING IN GENERAL</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHAOyM_JLM7IzEtXyE0sSS3KTMzRUUjOzy3IL84syczPU0jLL1IogKnRUUjMS0FwFXJTSzLyU3gYWNMSc4pTeaE0N4Oim2uIs4duakF-fGpxQWJyal5qSXxIuJGBkZGhmaWJuaMxMWoAoLYy3Q</recordid><startdate>20220501</startdate><enddate>20220501</enddate><creator>YAMADA, EIICHI</creator><creator>TAMAI, KAZUSEI</creator><scope>EVB</scope></search><sort><creationdate>20220501</creationdate><title>Polishing material, composition for polishing, and polishing method</title><author>YAMADA, EIICHI ; TAMAI, KAZUSEI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TW202216947A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2022</creationdate><topic>ADHESIVES</topic><topic>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</topic><topic>CHEMISTRY</topic><topic>DRESSING OR CONDITIONING OF ABRADING SURFACES</topic><topic>DYES</topic><topic>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</topic><topic>GRINDING</topic><topic>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</topic><topic>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>PAINTS</topic><topic>PERFORMING OPERATIONS</topic><topic>POLISHES</topic><topic>POLISHING</topic><topic>POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH</topic><topic>PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</topic><topic>SKI WAXES</topic><topic>SPRAYING OR ATOMISING IN GENERAL</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>YAMADA, EIICHI</creatorcontrib><creatorcontrib>TAMAI, KAZUSEI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YAMADA, EIICHI</au><au>TAMAI, KAZUSEI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Polishing material, composition for polishing, and polishing method</title><date>2022-05-01</date><risdate>2022</risdate><abstract>Provided are: a polishing material which is capable of removing rolling of the outer surface of a resin coating film by polishing and is not susceptible to the formation of polishing scratches; a composition for polishing; and a polishing method. This composition for polishing contains a polishing material which is composed of aluminum oxide particles having a specific surface area of from 5 m2/g to 50 m2/g (inclusive) and an average secondary particle diameter of from 0.05 [mu]m to 4.8 [mu]m (inclusive). This composition for polishing is used for polishing of the outer surface of a resin coating film.</abstract><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | chi ; eng |
recordid | cdi_epo_espacenet_TW202216947A |
source | esp@cenet |
subjects | ADHESIVES APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL CHEMISTRY DRESSING OR CONDITIONING OF ABRADING SURFACES DYES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PERFORMING OPERATIONS POLISHES POLISHING POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SKI WAXES SPRAYING OR ATOMISING IN GENERAL TRANSPORTING |
title | Polishing material, composition for polishing, and polishing method |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-20T14%3A51%3A55IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=YAMADA,%20EIICHI&rft.date=2022-05-01&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ETW202216947A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |