Forming method of semiconductor structure

A method for forming a semiconductor structure includes forming a pattern having first and second line features extending in a first direction on a substrate. After depositing a photoresist layer on the substrate to cover the pattern, the photoresist layer is patterned to form a cut pattern includin...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LIN, TZUNG-HUA, LIU, CHIAU, LIN, HUA-TAI, CHEN, YI-KO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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