Method of measuring a parameter of a lithographic process, measurement target for determination of a parameter of a lthographic process, substrate, and non-transistory computer program
A diffraction measurement target that has at least a first sub-target and at least a second sub-target, and wherein (1) the first and second sub-targets each include a pair of periodic structures and the first sub-target has a different design than the second sub-target, the different design includi...
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| creator | SMILDE, HENDRIK JAN HIDDE VAN DER SCHAAR, MAURITS ADAM, OMER ABUBAKER OMER DEN BOEF, ARIE JEFFREY KUBIS, MICHAEL VAN BUEL, HENRICUS WILHELMUS MARIA LIU, XING-LAN BHATTACHARYYA, KAUSTUVE FOUQUET, CHRISTOPHE DAVID FUCHS, ANDREAS BELTMAN, JOHANNES MARCUS MARIA VAN HAREN, RICHARD JOHANNES FRANCISCUS JAK, MARTIN JACOBUS JOHAN |
| description | A diffraction measurement target that has at least a first sub-target and at least a second sub-target, and wherein (1) the first and second sub-targets each include a pair of periodic structures and the first sub-target has a different design than the second sub-target, the different design including the first sub-target periodic structures having a different pitch, feature width, space width, and/or segmentation than the second sub-target periodic structure or (2) the first and second sub-targets respectively include a first and second periodic structure in a first layer, and a third periodic structure is located at least partly underneath the first periodic structure in a second layer under the first layer and there being no periodic structure underneath the second periodic structure in the second layer, and a fourth periodic structure is located at least partly underneath the second periodic structure in a third layer under the second layer. A method of devising such a measurement target involving locatin |
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A method of devising such a measurement target involving locatin</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING |
| title | Method of measuring a parameter of a lithographic process, measurement target for determination of a parameter of a lthographic process, substrate, and non-transistory computer program |
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