Temperature control method, semiconductor device manufacturing method, program, and substrate processing device

Temperature control method, semiconductor device manufacturing method, program, and substrate processing device

Provided is a technology for updating a future target temperature sequence in accordance with a current temperature, a final target temperature, and a lamp plate for temperature convergence, in the technology for controlling current heater supply power such that a predicted temperature sequence calc...

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Hauptverfasser: SHIGEMATSU, SEIYA, MAEDA, SHUHEI, YAMAGUCHI, HIDETO, UENO, MASAAKI, SUGISHITA, MASASHI
Format: Patent
Sprache:chi ; eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
CONTROLLING
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PHYSICS
REGULATING
SEMICONDUCTOR DEVICES
SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
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creator SHIGEMATSU, SEIYA
MAEDA, SHUHEI
YAMAGUCHI, HIDETO
UENO, MASAAKI
SUGISHITA, MASASHI
description Provided is a technology for updating a future target temperature sequence in accordance with a current temperature, a final target temperature, and a lamp plate for temperature convergence, in the technology for controlling current heater supply power such that a predicted temperature sequence calculated in accordance with a predicted model held in advance approaches the future target temperature sequence.
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subjects BASIC ELECTRIC ELEMENTS
CONTROLLING
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PHYSICS
REGULATING
SEMICONDUCTOR DEVICES
SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
title Temperature control method, semiconductor device manufacturing method, program, and substrate processing device
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