Methods and apparatus for reducing defects in preclean chambers

Apparatus and methods use a unique process kit to protect a processing volume of a process chamber. The process kit includes a shield with a frame configured to be insertable into a shield and a foil liner composed of a metallic material that is attachable to the frame at specific points. The specif...

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Hauptverfasser: JUPUDI, ANANTHKRISHNA, WEI, JUN-QI, ZHANG, KANG, OW, YUEH SHENG, WADA, YUICHI, TEO, KOK SEONG, BABU, SARATH, TAN, KOK WEI
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creator JUPUDI, ANANTHKRISHNA
WEI, JUN-QI
ZHANG, KANG
OW, YUEH SHENG
WADA, YUICHI
TEO, KOK SEONG
BABU, SARATH
TAN, KOK WEI
description Apparatus and methods use a unique process kit to protect a processing volume of a process chamber. The process kit includes a shield with a frame configured to be insertable into a shield and a foil liner composed of a metallic material that is attachable to the frame at specific points. The specific attachment points are spaced apart to produce an amount of flexibility based on a malleability of the metallic material. The amount of flexibility ranges from approximately 2.5 to approximately 4.5.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TW202209397A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TW202209397A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TW202209397A3</originalsourceid><addsrcrecordid>eNqNyrEKwjAQBuAsDqK-w_kAQkkH6SQiiotbwbGclz-2UJMjl76_iw_g9C3f2p0eqGMORpwCsSoXrotRzIUKwiJTelNAhFSjKZEWyAxOJCN_Xii2davIs2H3c-P2t2t_uR-geYApCxLq0D99433Ttd3x3P5zvo5pMRI</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Methods and apparatus for reducing defects in preclean chambers</title><source>esp@cenet</source><creator>JUPUDI, ANANTHKRISHNA ; WEI, JUN-QI ; ZHANG, KANG ; OW, YUEH SHENG ; WADA, YUICHI ; TEO, KOK SEONG ; BABU, SARATH ; TAN, KOK WEI</creator><creatorcontrib>JUPUDI, ANANTHKRISHNA ; WEI, JUN-QI ; ZHANG, KANG ; OW, YUEH SHENG ; WADA, YUICHI ; TEO, KOK SEONG ; BABU, SARATH ; TAN, KOK WEI</creatorcontrib><description>Apparatus and methods use a unique process kit to protect a processing volume of a process chamber. The process kit includes a shield with a frame configured to be insertable into a shield and a foil liner composed of a metallic material that is attachable to the frame at specific points. The specific attachment points are spaced apart to produce an amount of flexibility based on a malleability of the metallic material. The amount of flexibility ranges from approximately 2.5 to approximately 4.5.</description><language>chi ; eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20220301&amp;DB=EPODOC&amp;CC=TW&amp;NR=202209397A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76294</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20220301&amp;DB=EPODOC&amp;CC=TW&amp;NR=202209397A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>JUPUDI, ANANTHKRISHNA</creatorcontrib><creatorcontrib>WEI, JUN-QI</creatorcontrib><creatorcontrib>ZHANG, KANG</creatorcontrib><creatorcontrib>OW, YUEH SHENG</creatorcontrib><creatorcontrib>WADA, YUICHI</creatorcontrib><creatorcontrib>TEO, KOK SEONG</creatorcontrib><creatorcontrib>BABU, SARATH</creatorcontrib><creatorcontrib>TAN, KOK WEI</creatorcontrib><title>Methods and apparatus for reducing defects in preclean chambers</title><description>Apparatus and methods use a unique process kit to protect a processing volume of a process chamber. The process kit includes a shield with a frame configured to be insertable into a shield and a foil liner composed of a metallic material that is attachable to the frame at specific points. The specific attachment points are spaced apart to produce an amount of flexibility based on a malleability of the metallic material. The amount of flexibility ranges from approximately 2.5 to approximately 4.5.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyrEKwjAQBuAsDqK-w_kAQkkH6SQiiotbwbGclz-2UJMjl76_iw_g9C3f2p0eqGMORpwCsSoXrotRzIUKwiJTelNAhFSjKZEWyAxOJCN_Xii2davIs2H3c-P2t2t_uR-geYApCxLq0D99433Ttd3x3P5zvo5pMRI</recordid><startdate>20220301</startdate><enddate>20220301</enddate><creator>JUPUDI, ANANTHKRISHNA</creator><creator>WEI, JUN-QI</creator><creator>ZHANG, KANG</creator><creator>OW, YUEH SHENG</creator><creator>WADA, YUICHI</creator><creator>TEO, KOK SEONG</creator><creator>BABU, SARATH</creator><creator>TAN, KOK WEI</creator><scope>EVB</scope></search><sort><creationdate>20220301</creationdate><title>Methods and apparatus for reducing defects in preclean chambers</title><author>JUPUDI, ANANTHKRISHNA ; WEI, JUN-QI ; ZHANG, KANG ; OW, YUEH SHENG ; WADA, YUICHI ; TEO, KOK SEONG ; BABU, SARATH ; TAN, KOK WEI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TW202209397A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2022</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>JUPUDI, ANANTHKRISHNA</creatorcontrib><creatorcontrib>WEI, JUN-QI</creatorcontrib><creatorcontrib>ZHANG, KANG</creatorcontrib><creatorcontrib>OW, YUEH SHENG</creatorcontrib><creatorcontrib>WADA, YUICHI</creatorcontrib><creatorcontrib>TEO, KOK SEONG</creatorcontrib><creatorcontrib>BABU, SARATH</creatorcontrib><creatorcontrib>TAN, KOK WEI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>JUPUDI, ANANTHKRISHNA</au><au>WEI, JUN-QI</au><au>ZHANG, KANG</au><au>OW, YUEH SHENG</au><au>WADA, YUICHI</au><au>TEO, KOK SEONG</au><au>BABU, SARATH</au><au>TAN, KOK WEI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Methods and apparatus for reducing defects in preclean chambers</title><date>2022-03-01</date><risdate>2022</risdate><abstract>Apparatus and methods use a unique process kit to protect a processing volume of a process chamber. The process kit includes a shield with a frame configured to be insertable into a shield and a foil liner composed of a metallic material that is attachable to the frame at specific points. The specific attachment points are spaced apart to produce an amount of flexibility based on a malleability of the metallic material. The amount of flexibility ranges from approximately 2.5 to approximately 4.5.</abstract><oa>free_for_read</oa></addata></record>
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language chi ; eng
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title Methods and apparatus for reducing defects in preclean chambers
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-23T04%3A37%3A54IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=JUPUDI,%20ANANTHKRISHNA&rft.date=2022-03-01&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ETW202209397A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true