Cooling apparatus, lithographic apparatus and lithographic method
A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus compr...
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| creator | ENDENDIJK, WILFRED EDWARD ARLEMARK, ERIK JOHAN LEVASIER, LEON MARTIN VAN DER SANDEN, JACOBUS CORNELIS GERARDUS DONDERS, SJOERD NICOLAAS LAMBERTUS LAFARRE, RAYMOND WILHELMUS LOUIS JANSSEN, FRANCISCUS JOHANNES JOSEPH KOEVOETS, ADRIANUS HENDRIK DERKS, SANDER CATHARINA REINIER OVERKAMP, JIM VINCENT TEN KATE, NICOLAAS |
| description | A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate. |
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| language | chi ; eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | Cooling apparatus, lithographic apparatus and lithographic method |
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