Support structure for thermal processing systems

Support plates and support structures for thermal processing systems to heat workpieces are provided. In one example, a thermal processing apparatus is provided that includes a plurality of heat sources, a rotatable support plate, and a support structure having a flexibility in the radial direction...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HAMM, SILKE, MULLER, MANUEL, BREMENSDORFER, ROLF, WANSIDLER, ALEX
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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