Semiconductor photoresist composition and method of forming patterns using the composition

Disclosed are a semiconductor photoresist composition including an organometallic compound represented by Chemical Formula 1, a photoacid generator (PAG), and a solvent and a method of forming patterns using the same. Details of Chemical Formula 1 are as defined in the detailed description.

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Bibliographische Detailangaben
Hauptverfasser:	HAN, SEUNG, KIM, TAE-HO, KANG, EUN-MI, MOON, KYUNG-SOO, KIM, JAE-HYUN, NAMGUNG, RAN, CHEON, HWAN-SUNG, CHAE, SEUNG-YONG, KIM, JI-MIN, WOO, CHANG-SOO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	Disclosed are a semiconductor photoresist composition including an organometallic compound represented by Chemical Formula 1, a photoacid generator (PAG), and a solvent and a method of forming patterns using the same. Details of Chemical Formula 1 are as defined in the detailed description.