Substrate processing apparatus

The substrate processing apparatus includes first supply piping which guides a processing liquid from a first branching portion to a first chemical liquid nozzle, first return piping which guides the processing liquid from the first branching portion to a tank, a first pressure-loss setting unit whi...

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Bibliographische Detailangaben
1. Verfasser:	OKUYA, YOSUKE
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ACTUATING-FLOATS BASIC ELECTRIC ELEMENTS BLASTING COCKS DEVICES FOR VENTING OR AERATING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS HEATING LIGHTING MECHANICAL ENGINEERING SEMICONDUCTOR DEVICES TAPS THERMAL INSULATION IN GENERAL VALVES WEAPONS
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