Substrate processing apparatus and substrate processing method

To provide a technique that enables a reduction in an operation of a substrate processing apparatus and shortening of a time taken by substrate processing. A substrate processing apparatus comprises: a holding part for holding a substrate; a liquid supply part for supplying, to a main surface of the...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	OBARU, TAKANORI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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