Semiconductor photoresist composition, and method of forming patterns using the same
Disclosed are a semiconductor photoresist composition including an organometallic compound including at least one of the compounds represented by Chemical Formulae 1 to 3 and a solvent, and a method of forming patterns using the same. Details of Chemical Formulae 1 to 3 are as defined in the detaile...
Gespeichert in:
| Hauptverfasser: | , , , , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | chi ; eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | HAN, SEUNG KANG, EUN-MI MOON, KYUNG-SOO KIM, JAE-HYUN NAMGUNG, RAN CHEON, HWAN-SUNG CHAE, SEUNG-YONG KIM, JI-MIN WOO, CHANG-SOO |
| description | Disclosed are a semiconductor photoresist composition including an organometallic compound including at least one of the compounds represented by Chemical Formulae 1 to 3 and a solvent, and a method of forming patterns using the same. Details of Chemical Formulae 1 to 3 are as defined in the detailed description. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TW202116788A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TW202116788A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TW202116788A3</originalsourceid><addsrcrecordid>eNqNyjEKAjEQQNE0FqLeYewV3BV0WxHF3oDlEpKJCZiZkJm9vwoewOrx4c-NvWPJnilMXrlBTfwBJYuC51JZsmamDTgKUFATB-AIkVvJ9ITqVLGRwCTf1IQgruDSzKJ7Ca5-Lsz6erHn2xYrjyjVeSTU0T76Xd91h-MwnPb_PG8PLjmx</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Semiconductor photoresist composition, and method of forming patterns using the same</title><source>esp@cenet</source><creator>HAN, SEUNG ; KANG, EUN-MI ; MOON, KYUNG-SOO ; KIM, JAE-HYUN ; NAMGUNG, RAN ; CHEON, HWAN-SUNG ; CHAE, SEUNG-YONG ; KIM, JI-MIN ; WOO, CHANG-SOO</creator><creatorcontrib>HAN, SEUNG ; KANG, EUN-MI ; MOON, KYUNG-SOO ; KIM, JAE-HYUN ; NAMGUNG, RAN ; CHEON, HWAN-SUNG ; CHAE, SEUNG-YONG ; KIM, JI-MIN ; WOO, CHANG-SOO</creatorcontrib><description>Disclosed are a semiconductor photoresist composition including an organometallic compound including at least one of the compounds represented by Chemical Formulae 1 to 3 and a solvent, and a method of forming patterns using the same. Details of Chemical Formulae 1 to 3 are as defined in the detailed description.</description><language>chi ; eng</language><subject>ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM ; APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CHEMISTRY ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; METALLURGY ; ORGANIC CHEMISTRY ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210501&DB=EPODOC&CC=TW&NR=202116788A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210501&DB=EPODOC&CC=TW&NR=202116788A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HAN, SEUNG</creatorcontrib><creatorcontrib>KANG, EUN-MI</creatorcontrib><creatorcontrib>MOON, KYUNG-SOO</creatorcontrib><creatorcontrib>KIM, JAE-HYUN</creatorcontrib><creatorcontrib>NAMGUNG, RAN</creatorcontrib><creatorcontrib>CHEON, HWAN-SUNG</creatorcontrib><creatorcontrib>CHAE, SEUNG-YONG</creatorcontrib><creatorcontrib>KIM, JI-MIN</creatorcontrib><creatorcontrib>WOO, CHANG-SOO</creatorcontrib><title>Semiconductor photoresist composition, and method of forming patterns using the same</title><description>Disclosed are a semiconductor photoresist composition including an organometallic compound including at least one of the compounds represented by Chemical Formulae 1 to 3 and a solvent, and a method of forming patterns using the same. Details of Chemical Formulae 1 to 3 are as defined in the detailed description.</description><subject>ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>ORGANIC CHEMISTRY</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyjEKAjEQQNE0FqLeYewV3BV0WxHF3oDlEpKJCZiZkJm9vwoewOrx4c-NvWPJnilMXrlBTfwBJYuC51JZsmamDTgKUFATB-AIkVvJ9ITqVLGRwCTf1IQgruDSzKJ7Ca5-Lsz6erHn2xYrjyjVeSTU0T76Xd91h-MwnPb_PG8PLjmx</recordid><startdate>20210501</startdate><enddate>20210501</enddate><creator>HAN, SEUNG</creator><creator>KANG, EUN-MI</creator><creator>MOON, KYUNG-SOO</creator><creator>KIM, JAE-HYUN</creator><creator>NAMGUNG, RAN</creator><creator>CHEON, HWAN-SUNG</creator><creator>CHAE, SEUNG-YONG</creator><creator>KIM, JI-MIN</creator><creator>WOO, CHANG-SOO</creator><scope>EVB</scope></search><sort><creationdate>20210501</creationdate><title>Semiconductor photoresist composition, and method of forming patterns using the same</title><author>HAN, SEUNG ; KANG, EUN-MI ; MOON, KYUNG-SOO ; KIM, JAE-HYUN ; NAMGUNG, RAN ; CHEON, HWAN-SUNG ; CHAE, SEUNG-YONG ; KIM, JI-MIN ; WOO, CHANG-SOO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TW202116788A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2021</creationdate><topic>ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>ORGANIC CHEMISTRY</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>HAN, SEUNG</creatorcontrib><creatorcontrib>KANG, EUN-MI</creatorcontrib><creatorcontrib>MOON, KYUNG-SOO</creatorcontrib><creatorcontrib>KIM, JAE-HYUN</creatorcontrib><creatorcontrib>NAMGUNG, RAN</creatorcontrib><creatorcontrib>CHEON, HWAN-SUNG</creatorcontrib><creatorcontrib>CHAE, SEUNG-YONG</creatorcontrib><creatorcontrib>KIM, JI-MIN</creatorcontrib><creatorcontrib>WOO, CHANG-SOO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HAN, SEUNG</au><au>KANG, EUN-MI</au><au>MOON, KYUNG-SOO</au><au>KIM, JAE-HYUN</au><au>NAMGUNG, RAN</au><au>CHEON, HWAN-SUNG</au><au>CHAE, SEUNG-YONG</au><au>KIM, JI-MIN</au><au>WOO, CHANG-SOO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Semiconductor photoresist composition, and method of forming patterns using the same</title><date>2021-05-01</date><risdate>2021</risdate><abstract>Disclosed are a semiconductor photoresist composition including an organometallic compound including at least one of the compounds represented by Chemical Formulae 1 to 3 and a solvent, and a method of forming patterns using the same. Details of Chemical Formulae 1 to 3 are as defined in the detailed description.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | chi ; eng |
| recordid | cdi_epo_espacenet_TW202116788A |
| source | esp@cenet |
| subjects | ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | Semiconductor photoresist composition, and method of forming patterns using the same |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-03T16%3A31%3A39IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=HAN,%20SEUNG&rft.date=2021-05-01&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ETW202116788A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |