Systems and methods for feedforward process control in the manufacture of semiconductor devices

A method for process control in the manufacture of semiconductor devices including performing metrology on at least one Design of Experiment (DOE) semiconductor wafer included in a lot of semiconductor wafers, the lot forming part of a batch of semiconductor wafer lots, generating, based on the metr...

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Bibliographische Detailangaben
Hauptverfasser: VOLKOVICH, ROIE, YERUSHALMI, LIRAN, BAR, ACHIAM
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:A method for process control in the manufacture of semiconductor devices including performing metrology on at least one Design of Experiment (DOE) semiconductor wafer included in a lot of semiconductor wafers, the lot forming part of a batch of semiconductor wafer lots, generating, based on the metrology, one or more correctables to a process used to manufacture the lot of semiconductor wafers and adjusting, based on the correctables, the process performed on at least one of: other semiconductor wafers included in the lot of semiconductor wafers, and other lots of semiconductor wafers included in the batch.