Method and apparatus for lithographic process performance determination

A method and apparatus for determining a performance of a lithographic patterning process, the apparatus or method configured for or comprising: receiving an image of a portion of a substrate, the portion of the substrate comprising a first region comprising a first feature associated with a first l...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	WERKMAN, ROY, VERGAIJ-HUIZER, LYDIA MARIANNA, HAJIAHMADI, MOHAMMADREZA, LAM, PUI LENG, MINGHETTI, BLANDINE MARIE ANDREE RICHIT, BASTANI, VAHID, SPIERING, FRANS REINIER
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CALCULATING CINEMATOGRAPHY COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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