Apparatus and system having extraction assembly for wide angle ion beam

An ion beam processing apparatus may include a plasma chamber, and a plasma plate, disposed alongside the plasma chamber, where the plasma plate defines a first extraction aperture. The apparatus may include a beam blocker, disposed within the plasma chamber and facing the extraction aperture. The a...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SINCLAIR, FRANK, THOMAS, APPU NAVEEN, ROCKWELL, TYLER, CAMPBELL, CHRISTOPHER, BILOIU, COSTEL
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
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