Apparatus and system having extraction assembly for wide angle ion beam

Apparatus and system having extraction assembly for wide angle ion beam

An ion beam processing apparatus may include a plasma chamber, and a plasma plate, disposed alongside the plasma chamber, where the plasma plate defines a first extraction aperture. The apparatus may include a beam blocker, disposed within the plasma chamber and facing the extraction aperture. The a...

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Hauptverfasser: SINCLAIR, FRANK, THOMAS, APPU NAVEEN, ROCKWELL, TYLER, CAMPBELL, CHRISTOPHER, BILOIU, COSTEL
Format: Patent
Sprache:chi ; eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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creator SINCLAIR, FRANK
THOMAS, APPU NAVEEN
ROCKWELL, TYLER
CAMPBELL, CHRISTOPHER
BILOIU, COSTEL
description An ion beam processing apparatus may include a plasma chamber, and a plasma plate, disposed alongside the plasma chamber, where the plasma plate defines a first extraction aperture. The apparatus may include a beam blocker, disposed within the plasma chamber and facing the extraction aperture. The apparatus may further include a non-planar electrode, disposed adjacent the beam blocker and outside of the plasma chamber; and an extraction plate, disposed outside the plasma plate, and defining a second extraction aperture, aligned with the first extraction aperture.
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language chi ; eng
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
title Apparatus and system having extraction assembly for wide angle ion beam
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