Apparatuses and methods for plasma processing

A method of plasma processing comprises generating electrons in a source chamber, generating an electric potential gradient between the source chamber and a processing chamber by applying a first negative direct current (DC) voltage to the source chamber and a ground voltage to the processing chambe...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: VENTZEK, PETER, CHEN, ZHIYING, CARRUTH, MEGAN, NAGASEKI, KAZUYA, BLAKENEY, JOEL, RANJAN, ALOK
Format: Patent
Sprache:chi ; eng
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