Substrate drying chamber

A substrate drying chamber according to the present invention includes a heater embedded in at least one of an upper housing and a lower housing, a substrate placement plate which is coupled to a bottom surface of the lower housing and on which a substrate, on which an organic solvent is formed, is...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	SHIN, HEE-YONG, YOON, BYOUNG-MOON
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS BLASTING DRYING DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY HEATING LIGHTING MECHANICAL ENGINEERING SEMICONDUCTOR DEVICES WEAPONS
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Beschreibung
Zusammenfassung:	A substrate drying chamber according to the present invention includes a heater embedded in at least one of an upper housing and a lower housing, a substrate placement plate which is coupled to a bottom surface of the lower housing and on which a substrate, on which an organic solvent is formed, is placed, an integrated supply and discharge port, which is formed to extend from one side surface to the other side surface of the lower housing and face the substrate placement plate in an intermediate region between the one side surface and the other side surface and provides a supply path of a supercritical fluid for initial pressurization and a discharge path of a mixed fluid in which the organic solvent formed on the substrate after drying is dissolved, and an upper supply port which is formed on a central region of the upper housing to face the substrate placement plate and provides a supply path of the supercritical fluid for drying.