Sulfonium salt, photoacid generator, curable composition and resist composition

Provided are: a novel sulfonium salt which exhibits high photosensitivity to g rays or h rays; and a novel photoacid generator containing a sulfonium salt which exhibits high photosensitivity to g rays or h rays, high solubility in a solvent and a cationic polymerizable compound such as an epoxide,...

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Bibliographische Detailangaben
1. Verfasser:	NAKAO, TAKUTO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	Provided are: a novel sulfonium salt which exhibits high photosensitivity to g rays or h rays; and a novel photoacid generator containing a sulfonium salt which exhibits high photosensitivity to g rays or h rays, high solubility in a solvent and a cationic polymerizable compound such as an epoxide, and excellent storage stability in such a formulation. The present invention is a sulfonium salt represented by general formula (1) and a photoacid generator characterized by containing said sulfonium salt.