Self-aligned vertical integration of three-terminal memory devices

A three-dimensional (3D) memory structure includes memory cells and a plurality of oxide layers and a plurality of word line layers. The plurality of oxide layers and the plurality of word line layers are alternately stacked in a first direction. A plurality of double channel holes extend through th...

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Hauptverfasser: GUNAWAN, GERENG, WU, HUI-JUNG, SHEN, MEIHUA, LILL, THORSTEN, PAN, YANG, HOANG, JOHN
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creator GUNAWAN, GERENG
WU, HUI-JUNG
SHEN, MEIHUA
LILL, THORSTEN
PAN, YANG
HOANG, JOHN
description A three-dimensional (3D) memory structure includes memory cells and a plurality of oxide layers and a plurality of word line layers. The plurality of oxide layers and the plurality of word line layers are alternately stacked in a first direction. A plurality of double channel holes extend through the plurality of oxide layers and the plurality of word line layers in the first direction. The plurality of double channel holes have a peanut-shaped cross-section in a second direction that is transverse to the first direction.
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subjects ELECTRICITY
INFORMATION STORAGE
PHYSICS
STATIC STORES
title Self-aligned vertical integration of three-terminal memory devices
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