Cleaning device and method of cleaning
A cleaning device for an apparatus for processing production substrates, the cleaning device comprising: a body having dimensions similar to the production substrates so that the cleaning device is compatible with the apparatus, the body having a first major surface and a second major surface facing...
Gespeichert in:
| Hauptverfasser: | , , , , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | chi ; eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | HOLTRUST, MAARTEN YU, MIAO MIGCHELBRINK, FERDY TANASA, GHEORGHE LEMPENS, HAN HENRICUS ALDEGONDA GATTOBIGIO, GIOVANNI LUCA ARTS, PETRUS MARTINUS GERARDUS JOHANNES POLET, THEODORUS WILHELMUS EUMMELEN, ERIK HENRICUS EGIDIUS CATHARINA |
| description | A cleaning device for an apparatus for processing production substrates, the cleaning device comprising: a body having dimensions similar to the production substrates so that the cleaning device is compatible with the apparatus, the body having a first major surface and a second major surface facing in the opposite direction to the first major surface; a chamber within the body configured to accommodate contaminants; an inlet from the first major surface to the chamber and configured to allow contaminants to be drawn into the chamber by a flow of fluid; and an outlet from the chamber to the second major surface, the cleaning device being configured to allow the fluid to exit the chamber but to prevent a contaminant leaving the chamber. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TW202001433A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TW202001433A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TW202001433A3</originalsourceid><addsrcrecordid>eNrjZFBzzklNzMvMS1dISS3LTE5VSMxLUchNLcnIT1HIT1NIhsryMLCmJeYUp_JCaW4GRTfXEGcP3dSC_PjU4oLE5NS81JL4kHAjAyMDA0MTY2NHY2LUAAA7bSca</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Cleaning device and method of cleaning</title><source>esp@cenet</source><creator>HOLTRUST, MAARTEN ; YU, MIAO ; MIGCHELBRINK, FERDY ; TANASA, GHEORGHE ; LEMPENS, HAN HENRICUS ALDEGONDA ; GATTOBIGIO, GIOVANNI LUCA ; ARTS, PETRUS MARTINUS GERARDUS JOHANNES ; POLET, THEODORUS WILHELMUS ; EUMMELEN, ERIK HENRICUS EGIDIUS CATHARINA</creator><creatorcontrib>HOLTRUST, MAARTEN ; YU, MIAO ; MIGCHELBRINK, FERDY ; TANASA, GHEORGHE ; LEMPENS, HAN HENRICUS ALDEGONDA ; GATTOBIGIO, GIOVANNI LUCA ; ARTS, PETRUS MARTINUS GERARDUS JOHANNES ; POLET, THEODORUS WILHELMUS ; EUMMELEN, ERIK HENRICUS EGIDIUS CATHARINA</creatorcontrib><description>A cleaning device for an apparatus for processing production substrates, the cleaning device comprising: a body having dimensions similar to the production substrates so that the cleaning device is compatible with the apparatus, the body having a first major surface and a second major surface facing in the opposite direction to the first major surface; a chamber within the body configured to accommodate contaminants; an inlet from the first major surface to the chamber and configured to allow contaminants to be drawn into the chamber by a flow of fluid; and an outlet from the chamber to the second major surface, the cleaning device being configured to allow the fluid to exit the chamber but to prevent a contaminant leaving the chamber.</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200101&DB=EPODOC&CC=TW&NR=202001433A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25551,76302</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200101&DB=EPODOC&CC=TW&NR=202001433A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HOLTRUST, MAARTEN</creatorcontrib><creatorcontrib>YU, MIAO</creatorcontrib><creatorcontrib>MIGCHELBRINK, FERDY</creatorcontrib><creatorcontrib>TANASA, GHEORGHE</creatorcontrib><creatorcontrib>LEMPENS, HAN HENRICUS ALDEGONDA</creatorcontrib><creatorcontrib>GATTOBIGIO, GIOVANNI LUCA</creatorcontrib><creatorcontrib>ARTS, PETRUS MARTINUS GERARDUS JOHANNES</creatorcontrib><creatorcontrib>POLET, THEODORUS WILHELMUS</creatorcontrib><creatorcontrib>EUMMELEN, ERIK HENRICUS EGIDIUS CATHARINA</creatorcontrib><title>Cleaning device and method of cleaning</title><description>A cleaning device for an apparatus for processing production substrates, the cleaning device comprising: a body having dimensions similar to the production substrates so that the cleaning device is compatible with the apparatus, the body having a first major surface and a second major surface facing in the opposite direction to the first major surface; a chamber within the body configured to accommodate contaminants; an inlet from the first major surface to the chamber and configured to allow contaminants to be drawn into the chamber by a flow of fluid; and an outlet from the chamber to the second major surface, the cleaning device being configured to allow the fluid to exit the chamber but to prevent a contaminant leaving the chamber.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFBzzklNzMvMS1dISS3LTE5VSMxLUchNLcnIT1HIT1NIhsryMLCmJeYUp_JCaW4GRTfXEGcP3dSC_PjU4oLE5NS81JL4kHAjAyMDA0MTY2NHY2LUAAA7bSca</recordid><startdate>20200101</startdate><enddate>20200101</enddate><creator>HOLTRUST, MAARTEN</creator><creator>YU, MIAO</creator><creator>MIGCHELBRINK, FERDY</creator><creator>TANASA, GHEORGHE</creator><creator>LEMPENS, HAN HENRICUS ALDEGONDA</creator><creator>GATTOBIGIO, GIOVANNI LUCA</creator><creator>ARTS, PETRUS MARTINUS GERARDUS JOHANNES</creator><creator>POLET, THEODORUS WILHELMUS</creator><creator>EUMMELEN, ERIK HENRICUS EGIDIUS CATHARINA</creator><scope>EVB</scope></search><sort><creationdate>20200101</creationdate><title>Cleaning device and method of cleaning</title><author>HOLTRUST, MAARTEN ; YU, MIAO ; MIGCHELBRINK, FERDY ; TANASA, GHEORGHE ; LEMPENS, HAN HENRICUS ALDEGONDA ; GATTOBIGIO, GIOVANNI LUCA ; ARTS, PETRUS MARTINUS GERARDUS JOHANNES ; POLET, THEODORUS WILHELMUS ; EUMMELEN, ERIK HENRICUS EGIDIUS CATHARINA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TW202001433A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2020</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>HOLTRUST, MAARTEN</creatorcontrib><creatorcontrib>YU, MIAO</creatorcontrib><creatorcontrib>MIGCHELBRINK, FERDY</creatorcontrib><creatorcontrib>TANASA, GHEORGHE</creatorcontrib><creatorcontrib>LEMPENS, HAN HENRICUS ALDEGONDA</creatorcontrib><creatorcontrib>GATTOBIGIO, GIOVANNI LUCA</creatorcontrib><creatorcontrib>ARTS, PETRUS MARTINUS GERARDUS JOHANNES</creatorcontrib><creatorcontrib>POLET, THEODORUS WILHELMUS</creatorcontrib><creatorcontrib>EUMMELEN, ERIK HENRICUS EGIDIUS CATHARINA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HOLTRUST, MAARTEN</au><au>YU, MIAO</au><au>MIGCHELBRINK, FERDY</au><au>TANASA, GHEORGHE</au><au>LEMPENS, HAN HENRICUS ALDEGONDA</au><au>GATTOBIGIO, GIOVANNI LUCA</au><au>ARTS, PETRUS MARTINUS GERARDUS JOHANNES</au><au>POLET, THEODORUS WILHELMUS</au><au>EUMMELEN, ERIK HENRICUS EGIDIUS CATHARINA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Cleaning device and method of cleaning</title><date>2020-01-01</date><risdate>2020</risdate><abstract>A cleaning device for an apparatus for processing production substrates, the cleaning device comprising: a body having dimensions similar to the production substrates so that the cleaning device is compatible with the apparatus, the body having a first major surface and a second major surface facing in the opposite direction to the first major surface; a chamber within the body configured to accommodate contaminants; an inlet from the first major surface to the chamber and configured to allow contaminants to be drawn into the chamber by a flow of fluid; and an outlet from the chamber to the second major surface, the cleaning device being configured to allow the fluid to exit the chamber but to prevent a contaminant leaving the chamber.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | chi ; eng |
| recordid | cdi_epo_espacenet_TW202001433A |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Cleaning device and method of cleaning |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-16T02%3A59%3A01IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=HOLTRUST,%20MAARTEN&rft.date=2020-01-01&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ETW202001433A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |