Method of optimizing a metrology process

Method of optimizing a metrology process are disclosed. In one arrangement, measurement data from a plurality of applications of the metrology process to a first target on a substrate are obtained. Each application of the metrology process comprises illuminating the first target with a radiation spo...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KONTOROUPI, THALEIA, REHMAN, SAMEE UR, ZAAL, MARTIJN MARIA, TSIATMAS, ANAGNOSTIS, FAGGINGER AUER, BASTIAAN ONNE, VENSELAAR, JOANNES JITSE, MEDVEDYEVA, MARIYA VYACHESLAVIVNA
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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