Position detection device, position detection method, and vapor deposition apparatus capable of improving the detection accuracy of the position of a substrate

The present invention provides a position detection device, a position detection method, and a vapor deposition apparatus capable of improving the detection accuracy of the position of a substrate. An image processing part 20 calculates the relative position between the cameras 11 of a surface photo...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	BANNAI, YUYA, YANAGIHORI, FUMITSUGU, YOSHIDA, YUICHI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CALCULATING CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPUTING COUNTING DIFFUSION TREATMENT OF METALLIC MATERIAL HANDLING RECORD CARRIERS IMAGE DATA PROCESSING OR GENERATION, IN GENERAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PHYSICS PRESENTATION OF DATA RECOGNITION OF DATA RECORD CARRIERS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Schreiben Sie den ersten Kommentar!