Inspection device for masks for semiconductor lithography and method

The invention relates to an inspection device (4) for masks (8) for semiconductor lithography, comprising an imaging device (9) for imaging a mask (8), and an image recording device (10), wherein one or more correction bodies (21, 21', 21") which exhibit a dispersive behavior for at least...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SEITZ, HOLGER, ZEUNER, THOMAS, FELDMANN, HEIKO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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