Extractor electrode for electron source
Extractors and extractor systems minimize the generation of secondary electrons which interact with and degrade the primary electron beam. This can improve the performance of an electron beam system, such as a scanning electron microscope. The extractor may include a frustoconical aperture that wide...
Gespeichert in:
Hauptverfasser: | , , , , , , , |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | CHUBUN, NIKOLAI BUI, DANIEL GRELLA, LUCA JIANG, XINRONG FLORENDO, OSCAR G CUMMINGS, KEVIN HORDON, LAURENCE S SEARS, CHRISTOPHER |
description | Extractors and extractor systems minimize the generation of secondary electrons which interact with and degrade the primary electron beam. This can improve the performance of an electron beam system, such as a scanning electron microscope. The extractor may include a frustoconical aperture that widens as distance from the source of the electron beam increases. The entrance into the frustoconical aperture also can include a curved edge. |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TW201841184A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TW201841184A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TW201841184A3</originalsourceid><addsrcrecordid>eNrjZFB3rSgpSkwuyS9SSM1JTS4pyk9JVUhD8PIUivNLi5JTeRhY0xJzilN5oTQ3g6Kba4izh25qQX58anFBYnJqXmpJfEi4kYGhhYkhEDsaE6MGAMWbKGM</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Extractor electrode for electron source</title><source>esp@cenet</source><creator>CHUBUN, NIKOLAI ; BUI, DANIEL ; GRELLA, LUCA ; JIANG, XINRONG ; FLORENDO, OSCAR G ; CUMMINGS, KEVIN ; HORDON, LAURENCE S ; SEARS, CHRISTOPHER</creator><creatorcontrib>CHUBUN, NIKOLAI ; BUI, DANIEL ; GRELLA, LUCA ; JIANG, XINRONG ; FLORENDO, OSCAR G ; CUMMINGS, KEVIN ; HORDON, LAURENCE S ; SEARS, CHRISTOPHER</creatorcontrib><description>Extractors and extractor systems minimize the generation of secondary electrons which interact with and degrade the primary electron beam. This can improve the performance of an electron beam system, such as a scanning electron microscope. The extractor may include a frustoconical aperture that widens as distance from the source of the electron beam increases. The entrance into the frustoconical aperture also can include a curved edge.</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20181116&DB=EPODOC&CC=TW&NR=201841184A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20181116&DB=EPODOC&CC=TW&NR=201841184A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CHUBUN, NIKOLAI</creatorcontrib><creatorcontrib>BUI, DANIEL</creatorcontrib><creatorcontrib>GRELLA, LUCA</creatorcontrib><creatorcontrib>JIANG, XINRONG</creatorcontrib><creatorcontrib>FLORENDO, OSCAR G</creatorcontrib><creatorcontrib>CUMMINGS, KEVIN</creatorcontrib><creatorcontrib>HORDON, LAURENCE S</creatorcontrib><creatorcontrib>SEARS, CHRISTOPHER</creatorcontrib><title>Extractor electrode for electron source</title><description>Extractors and extractor systems minimize the generation of secondary electrons which interact with and degrade the primary electron beam. This can improve the performance of an electron beam system, such as a scanning electron microscope. The extractor may include a frustoconical aperture that widens as distance from the source of the electron beam increases. The entrance into the frustoconical aperture also can include a curved edge.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFB3rSgpSkwuyS9SSM1JTS4pyk9JVUhD8PIUivNLi5JTeRhY0xJzilN5oTQ3g6Kba4izh25qQX58anFBYnJqXmpJfEi4kYGhhYkhEDsaE6MGAMWbKGM</recordid><startdate>20181116</startdate><enddate>20181116</enddate><creator>CHUBUN, NIKOLAI</creator><creator>BUI, DANIEL</creator><creator>GRELLA, LUCA</creator><creator>JIANG, XINRONG</creator><creator>FLORENDO, OSCAR G</creator><creator>CUMMINGS, KEVIN</creator><creator>HORDON, LAURENCE S</creator><creator>SEARS, CHRISTOPHER</creator><scope>EVB</scope></search><sort><creationdate>20181116</creationdate><title>Extractor electrode for electron source</title><author>CHUBUN, NIKOLAI ; BUI, DANIEL ; GRELLA, LUCA ; JIANG, XINRONG ; FLORENDO, OSCAR G ; CUMMINGS, KEVIN ; HORDON, LAURENCE S ; SEARS, CHRISTOPHER</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TW201841184A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2018</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>CHUBUN, NIKOLAI</creatorcontrib><creatorcontrib>BUI, DANIEL</creatorcontrib><creatorcontrib>GRELLA, LUCA</creatorcontrib><creatorcontrib>JIANG, XINRONG</creatorcontrib><creatorcontrib>FLORENDO, OSCAR G</creatorcontrib><creatorcontrib>CUMMINGS, KEVIN</creatorcontrib><creatorcontrib>HORDON, LAURENCE S</creatorcontrib><creatorcontrib>SEARS, CHRISTOPHER</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CHUBUN, NIKOLAI</au><au>BUI, DANIEL</au><au>GRELLA, LUCA</au><au>JIANG, XINRONG</au><au>FLORENDO, OSCAR G</au><au>CUMMINGS, KEVIN</au><au>HORDON, LAURENCE S</au><au>SEARS, CHRISTOPHER</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Extractor electrode for electron source</title><date>2018-11-16</date><risdate>2018</risdate><abstract>Extractors and extractor systems minimize the generation of secondary electrons which interact with and degrade the primary electron beam. This can improve the performance of an electron beam system, such as a scanning electron microscope. The extractor may include a frustoconical aperture that widens as distance from the source of the electron beam increases. The entrance into the frustoconical aperture also can include a curved edge.</abstract><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | chi ; eng |
recordid | cdi_epo_espacenet_TW201841184A |
source | esp@cenet |
subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
title | Extractor electrode for electron source |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-06T01%3A52%3A40IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=CHUBUN,%20NIKOLAI&rft.date=2018-11-16&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ETW201841184A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |