Method of determining output flow rate of gas output by flow rate controller of substrate processing apparatus

In a method of an embodiment, a pressure sensor is selected from first and second pressure sensors according to a set flow rate. A measurable maximum pressure of the second pressure sensor is higher than a measurable maximum pressure of first pressure sensor. The target pressure of a chamber is dete...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HOSHI, NAOTSUGU, FUJII, HIROSHI, TSURUTA, TOSHIHIRO, AKIBA, JUNICHI, JAMI, NAOYA, HAYASAKA, SHINICHIRO, YAMASHIMA, JUN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CONTROLLING PHYSICS REGULATING SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
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