Method of manufacturing composite layer
The present technique relates to a method for preparing a composite membrane. In the method for preparing a composite membrane according to the present embodiment, a first material layer, which is composed of at least one layer, is deposited by using a first source gas containing a first component a...
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| creator | CHO, BYUNGUL JIN, KWANG-SEON CHUN, JIN SUNG YI, IN-HWAN |
| description | The present technique relates to a method for preparing a composite membrane. In the method for preparing a composite membrane according to the present embodiment, a first material layer, which is composed of at least one layer, is deposited by using a first source gas containing a first component and a reaction gas containing oxygen reacting with the first source gas. A second material layer, which is composed of at least one layer, is deposited on the first material layer by using a second source gas containing a second component different from the first component and a reaction gas containing oxygen reacting with the second source gas. A step for depositing the first material layer and a step for depositing the second material layer are set to one cycle, and the cycle is performed at least once. |
| format | Patent |
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In the method for preparing a composite membrane according to the present embodiment, a first material layer, which is composed of at least one layer, is deposited by using a first source gas containing a first component and a reaction gas containing oxygen reacting with the first source gas. A second material layer, which is composed of at least one layer, is deposited on the first material layer by using a second source gas containing a second component different from the first component and a reaction gas containing oxygen reacting with the second source gas. A step for depositing the first material layer and a step for depositing the second material layer are set to one cycle, and the cycle is performed at least once.</description><language>chi ; eng</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SEMICONDUCTOR DEVICES ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180601&DB=EPODOC&CC=TW&NR=201819675A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25551,76302</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180601&DB=EPODOC&CC=TW&NR=201819675A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CHO, BYUNGUL</creatorcontrib><creatorcontrib>JIN, KWANG-SEON</creatorcontrib><creatorcontrib>CHUN, JIN SUNG</creatorcontrib><creatorcontrib>YI, IN-HWAN</creatorcontrib><title>Method of manufacturing composite layer</title><description>The present technique relates to a method for preparing a composite membrane. In the method for preparing a composite membrane according to the present embodiment, a first material layer, which is composed of at least one layer, is deposited by using a first source gas containing a first component and a reaction gas containing oxygen reacting with the first source gas. A second material layer, which is composed of at least one layer, is deposited on the first material layer by using a second source gas containing a second component different from the first component and a reaction gas containing oxygen reacting with the second source gas. A step for depositing the first material layer and a step for depositing the second material layer are set to one cycle, and the cycle is performed at least once.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFD3TS3JyE9RyE9TyE3MK01LTC4pLcrMS1dIzs8tyC_OLElVyEmsTC3iYWBNS8wpTuWF0twMim6uIc4euqkF-fGpxQWJyal5qSXxIeFGBoYWhpZm5qaOxsSoAQC9PShq</recordid><startdate>20180601</startdate><enddate>20180601</enddate><creator>CHO, BYUNGUL</creator><creator>JIN, KWANG-SEON</creator><creator>CHUN, JIN SUNG</creator><creator>YI, IN-HWAN</creator><scope>EVB</scope></search><sort><creationdate>20180601</creationdate><title>Method of manufacturing composite layer</title><author>CHO, BYUNGUL ; JIN, KWANG-SEON ; CHUN, JIN SUNG ; YI, IN-HWAN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TW201819675A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2018</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>CHO, BYUNGUL</creatorcontrib><creatorcontrib>JIN, KWANG-SEON</creatorcontrib><creatorcontrib>CHUN, JIN SUNG</creatorcontrib><creatorcontrib>YI, IN-HWAN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CHO, BYUNGUL</au><au>JIN, KWANG-SEON</au><au>CHUN, JIN SUNG</au><au>YI, IN-HWAN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Method of manufacturing composite layer</title><date>2018-06-01</date><risdate>2018</risdate><abstract>The present technique relates to a method for preparing a composite membrane. In the method for preparing a composite membrane according to the present embodiment, a first material layer, which is composed of at least one layer, is deposited by using a first source gas containing a first component and a reaction gas containing oxygen reacting with the first source gas. A second material layer, which is composed of at least one layer, is deposited on the first material layer by using a second source gas containing a second component different from the first component and a reaction gas containing oxygen reacting with the second source gas. A step for depositing the first material layer and a step for depositing the second material layer are set to one cycle, and the cycle is performed at least once.</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | Method of manufacturing composite layer |
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