High-purity dispense system
Techniques herein include a bladder-based dispense system using an elongate bladder configured to selectively expand and contract to assist with dispense actions. This dispense system compensates for filter-lag, which often accompanies fluid filtering for microfabrication. This dispense system also...
Gespeichert in:
| Hauptverfasser: | , , , , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | chi ; eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | ROBISON, RODNEY L NASMAN, RONALD HETZER, DAVID GROOTEGOED, JAMES JACOBSON, NORMAN A. JR DEVILLIERS, ANTON J HULI, LIOR HOOGE, JOSHUA S TRAVIS, DAVID |
| description | Techniques herein include a bladder-based dispense system using an elongate bladder configured to selectively expand and contract to assist with dispense actions. This dispense system compensates for filter-lag, which often accompanies fluid filtering for microfabrication. This dispense system also provides a high-purity and high precision dispense unit. A process fluid filter is located downstream from a process fluid source as well as a system valve. Downstream from the process fluid filter there are no valves. Dispense actions can be initiated and stop while the system valve is open by using the elongate bladder. The elongate bladder can be expanded to stop or pause a dispense action, and then be contracted to assist with a dispense action. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TW201816958A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TW201816958A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TW201816958A3</originalsourceid><addsrcrecordid>eNrjZJD2yEzP0C0oLcosqVRIySwuSM0rTlUoriwuSc3lYWBNS8wpTuWF0twMim6uIc4euqkF-fGpxQWJyal5qSXxIeFGBoYWhmaWphaOxsSoAQCRpCPg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>High-purity dispense system</title><source>esp@cenet</source><creator>ROBISON, RODNEY L ; NASMAN, RONALD ; HETZER, DAVID ; GROOTEGOED, JAMES ; JACOBSON, NORMAN A. JR ; DEVILLIERS, ANTON J ; HULI, LIOR ; HOOGE, JOSHUA S ; TRAVIS, DAVID</creator><creatorcontrib>ROBISON, RODNEY L ; NASMAN, RONALD ; HETZER, DAVID ; GROOTEGOED, JAMES ; JACOBSON, NORMAN A. JR ; DEVILLIERS, ANTON J ; HULI, LIOR ; HOOGE, JOSHUA S ; TRAVIS, DAVID</creatorcontrib><description>Techniques herein include a bladder-based dispense system using an elongate bladder configured to selectively expand and contract to assist with dispense actions. This dispense system compensates for filter-lag, which often accompanies fluid filtering for microfabrication. This dispense system also provides a high-purity and high precision dispense unit. A process fluid filter is located downstream from a process fluid source as well as a system valve. Downstream from the process fluid filter there are no valves. Dispense actions can be initiated and stop while the system valve is open by using the elongate bladder. The elongate bladder can be expanded to stop or pause a dispense action, and then be contracted to assist with a dispense action.</description><language>chi ; eng</language><subject>ACTUATING-FLOATS ; APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL ; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ; ATOMISING APPARATUS ; BASIC ELECTRIC ELEMENTS ; BLASTING ; COCKS ; CONTROLLING ; DEVICES FOR VENTING OR AERATING ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ENGINEERING ELEMENTS AND UNITS ; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS ; HEATING ; LIGHTING ; MECHANICAL ENGINEERING ; NOZZLES ; PERFORMING OPERATIONS ; PHYSICS ; REGULATING ; SEMICONDUCTOR DEVICES ; SPRAYING APPARATUS ; SPRAYING OR ATOMISING IN GENERAL ; SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES ; TAPS ; THERMAL INSULATION IN GENERAL ; TRANSPORTING ; VALVES ; WEAPONS</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180501&DB=EPODOC&CC=TW&NR=201816958A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180501&DB=EPODOC&CC=TW&NR=201816958A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ROBISON, RODNEY L</creatorcontrib><creatorcontrib>NASMAN, RONALD</creatorcontrib><creatorcontrib>HETZER, DAVID</creatorcontrib><creatorcontrib>GROOTEGOED, JAMES</creatorcontrib><creatorcontrib>JACOBSON, NORMAN A. JR</creatorcontrib><creatorcontrib>DEVILLIERS, ANTON J</creatorcontrib><creatorcontrib>HULI, LIOR</creatorcontrib><creatorcontrib>HOOGE, JOSHUA S</creatorcontrib><creatorcontrib>TRAVIS, DAVID</creatorcontrib><title>High-purity dispense system</title><description>Techniques herein include a bladder-based dispense system using an elongate bladder configured to selectively expand and contract to assist with dispense actions. This dispense system compensates for filter-lag, which often accompanies fluid filtering for microfabrication. This dispense system also provides a high-purity and high precision dispense unit. A process fluid filter is located downstream from a process fluid source as well as a system valve. Downstream from the process fluid filter there are no valves. Dispense actions can be initiated and stop while the system valve is open by using the elongate bladder. The elongate bladder can be expanded to stop or pause a dispense action, and then be contracted to assist with a dispense action.</description><subject>ACTUATING-FLOATS</subject><subject>APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</subject><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</subject><subject>ATOMISING APPARATUS</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>BLASTING</subject><subject>COCKS</subject><subject>CONTROLLING</subject><subject>DEVICES FOR VENTING OR AERATING</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ENGINEERING ELEMENTS AND UNITS</subject><subject>GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS</subject><subject>HEATING</subject><subject>LIGHTING</subject><subject>MECHANICAL ENGINEERING</subject><subject>NOZZLES</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICS</subject><subject>REGULATING</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SPRAYING APPARATUS</subject><subject>SPRAYING OR ATOMISING IN GENERAL</subject><subject>SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES</subject><subject>TAPS</subject><subject>THERMAL INSULATION IN GENERAL</subject><subject>TRANSPORTING</subject><subject>VALVES</subject><subject>WEAPONS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJD2yEzP0C0oLcosqVRIySwuSM0rTlUoriwuSc3lYWBNS8wpTuWF0twMim6uIc4euqkF-fGpxQWJyal5qSXxIeFGBoYWhmaWphaOxsSoAQCRpCPg</recordid><startdate>20180501</startdate><enddate>20180501</enddate><creator>ROBISON, RODNEY L</creator><creator>NASMAN, RONALD</creator><creator>HETZER, DAVID</creator><creator>GROOTEGOED, JAMES</creator><creator>JACOBSON, NORMAN A. JR</creator><creator>DEVILLIERS, ANTON J</creator><creator>HULI, LIOR</creator><creator>HOOGE, JOSHUA S</creator><creator>TRAVIS, DAVID</creator><scope>EVB</scope></search><sort><creationdate>20180501</creationdate><title>High-purity dispense system</title><author>ROBISON, RODNEY L ; NASMAN, RONALD ; HETZER, DAVID ; GROOTEGOED, JAMES ; JACOBSON, NORMAN A. JR ; DEVILLIERS, ANTON J ; HULI, LIOR ; HOOGE, JOSHUA S ; TRAVIS, DAVID</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TW201816958A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2018</creationdate><topic>ACTUATING-FLOATS</topic><topic>APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</topic><topic>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</topic><topic>ATOMISING APPARATUS</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>BLASTING</topic><topic>COCKS</topic><topic>CONTROLLING</topic><topic>DEVICES FOR VENTING OR AERATING</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ENGINEERING ELEMENTS AND UNITS</topic><topic>GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS</topic><topic>HEATING</topic><topic>LIGHTING</topic><topic>MECHANICAL ENGINEERING</topic><topic>NOZZLES</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICS</topic><topic>REGULATING</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SPRAYING APPARATUS</topic><topic>SPRAYING OR ATOMISING IN GENERAL</topic><topic>SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES</topic><topic>TAPS</topic><topic>THERMAL INSULATION IN GENERAL</topic><topic>TRANSPORTING</topic><topic>VALVES</topic><topic>WEAPONS</topic><toplevel>online_resources</toplevel><creatorcontrib>ROBISON, RODNEY L</creatorcontrib><creatorcontrib>NASMAN, RONALD</creatorcontrib><creatorcontrib>HETZER, DAVID</creatorcontrib><creatorcontrib>GROOTEGOED, JAMES</creatorcontrib><creatorcontrib>JACOBSON, NORMAN A. JR</creatorcontrib><creatorcontrib>DEVILLIERS, ANTON J</creatorcontrib><creatorcontrib>HULI, LIOR</creatorcontrib><creatorcontrib>HOOGE, JOSHUA S</creatorcontrib><creatorcontrib>TRAVIS, DAVID</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ROBISON, RODNEY L</au><au>NASMAN, RONALD</au><au>HETZER, DAVID</au><au>GROOTEGOED, JAMES</au><au>JACOBSON, NORMAN A. JR</au><au>DEVILLIERS, ANTON J</au><au>HULI, LIOR</au><au>HOOGE, JOSHUA S</au><au>TRAVIS, DAVID</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>High-purity dispense system</title><date>2018-05-01</date><risdate>2018</risdate><abstract>Techniques herein include a bladder-based dispense system using an elongate bladder configured to selectively expand and contract to assist with dispense actions. This dispense system compensates for filter-lag, which often accompanies fluid filtering for microfabrication. This dispense system also provides a high-purity and high precision dispense unit. A process fluid filter is located downstream from a process fluid source as well as a system valve. Downstream from the process fluid filter there are no valves. Dispense actions can be initiated and stop while the system valve is open by using the elongate bladder. The elongate bladder can be expanded to stop or pause a dispense action, and then be contracted to assist with a dispense action.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | chi ; eng |
| recordid | cdi_epo_espacenet_TW201816958A |
| source | esp@cenet |
| subjects | ACTUATING-FLOATS APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ATOMISING APPARATUS BASIC ELECTRIC ELEMENTS BLASTING COCKS CONTROLLING DEVICES FOR VENTING OR AERATING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS HEATING LIGHTING MECHANICAL ENGINEERING NOZZLES PERFORMING OPERATIONS PHYSICS REGULATING SEMICONDUCTOR DEVICES SPRAYING APPARATUS SPRAYING OR ATOMISING IN GENERAL SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES TAPS THERMAL INSULATION IN GENERAL TRANSPORTING VALVES WEAPONS |
| title | High-purity dispense system |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-13T02%3A01%3A49IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=ROBISON,%20RODNEY%20L&rft.date=2018-05-01&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ETW201816958A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |