Illumination optical unit for projection lithography

An illumination optical unit for projection lithography serves for illuminating an object field (8), in which an object (12) to be imaged is arrangeable, along an illumination beam path. A first facet mirror (6) has first facets (21) for reflecting guidance of illumination light (3) and for arrangem...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	BIELING, STIG, VAN GORKOM, RAMON, ENDRES, MARTIN, MERTENS, BASTIAAN MATTHIAS, WISCHMEIER, LARS, MAUL, MANFRED
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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