Polishing pad, polishing method using the polishing pad, and using method of the same eliminating or reducing the pre-polishing time to realize simplified polishing

Provided is a polishing pad including a resin foaming body composed of thermoplastic resin, capable of eliminating or reducing pre-polishing time to realize simplified polishing. Moreover, the polishing having efficiency and high reliability can be possible by continuously performing the polishing c...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: YAMAMOTO, SHUNJI, MASUDA, MITSUO, YOKOTA, NOBUTOSHI, KUBOTA, TETSUHARU, TODA, SADAYUKI
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator YAMAMOTO, SHUNJI
MASUDA, MITSUO
YOKOTA, NOBUTOSHI
KUBOTA, TETSUHARU
TODA, SADAYUKI
description Provided is a polishing pad including a resin foaming body composed of thermoplastic resin, capable of eliminating or reducing pre-polishing time to realize simplified polishing. Moreover, the polishing having efficiency and high reliability can be possible by continuously performing the polishing continuously with excellent polishing speed during initial stage, and re-polishing is also excellent. The polishing pads (1, 2) are composed of a high-rigidity thermoplastic hard resin foaming body having a three-dimensional structure, wherein the three-dimensional air chamber structure is formed by a plurality of air chambers and cell walls that partition the cells to enable it to have mutually independent partitioning. The polishing pad is a structural body as following: the mechanical characteristic of the wall part of the cell wall is configured as a value represented by the mechanical characteristic of a resin sheet before foaming, wherein the tensile strength is 50 MPa to 90 MPa, the bending strength is 90 MPa
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TW201714704A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TW201714704A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TW201714704A3</originalsourceid><addsrcrecordid>eNqNjbsKwkAQRdNYiPoPa28g0UDqIIqlRcAyDNmJO7AvdjeN3-OHugkxsbQaLufcO-vkfTeSvCD9ZBb4gdk5KgzCcNb7IQSBP2g0QX_hZJpu1DwoZChJkYYwYOOYQ963847DdNkKFPVgogKSXrFOykrqCPnycJusOpAed9PdJPvrpT7fUrSmQW-hRY2hqR_HLC_zosyK6vSP8wF_6lbQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Polishing pad, polishing method using the polishing pad, and using method of the same eliminating or reducing the pre-polishing time to realize simplified polishing</title><source>esp@cenet</source><creator>YAMAMOTO, SHUNJI ; MASUDA, MITSUO ; YOKOTA, NOBUTOSHI ; KUBOTA, TETSUHARU ; TODA, SADAYUKI</creator><creatorcontrib>YAMAMOTO, SHUNJI ; MASUDA, MITSUO ; YOKOTA, NOBUTOSHI ; KUBOTA, TETSUHARU ; TODA, SADAYUKI</creatorcontrib><description>Provided is a polishing pad including a resin foaming body composed of thermoplastic resin, capable of eliminating or reducing pre-polishing time to realize simplified polishing. Moreover, the polishing having efficiency and high reliability can be possible by continuously performing the polishing continuously with excellent polishing speed during initial stage, and re-polishing is also excellent. The polishing pads (1, 2) are composed of a high-rigidity thermoplastic hard resin foaming body having a three-dimensional structure, wherein the three-dimensional air chamber structure is formed by a plurality of air chambers and cell walls that partition the cells to enable it to have mutually independent partitioning. The polishing pad is a structural body as following: the mechanical characteristic of the wall part of the cell wall is configured as a value represented by the mechanical characteristic of a resin sheet before foaming, wherein the tensile strength is 50 MPa to 90 MPa, the bending strength is 90 MPa</description><language>chi ; eng</language><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; GRINDING ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; PERFORMING OPERATIONS ; POLISHING ; TOOLS FOR GRINDING, BUFFING, OR SHARPENING ; TRANSPORTING</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20170501&amp;DB=EPODOC&amp;CC=TW&amp;NR=201714704A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20170501&amp;DB=EPODOC&amp;CC=TW&amp;NR=201714704A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YAMAMOTO, SHUNJI</creatorcontrib><creatorcontrib>MASUDA, MITSUO</creatorcontrib><creatorcontrib>YOKOTA, NOBUTOSHI</creatorcontrib><creatorcontrib>KUBOTA, TETSUHARU</creatorcontrib><creatorcontrib>TODA, SADAYUKI</creatorcontrib><title>Polishing pad, polishing method using the polishing pad, and using method of the same eliminating or reducing the pre-polishing time to realize simplified polishing</title><description>Provided is a polishing pad including a resin foaming body composed of thermoplastic resin, capable of eliminating or reducing pre-polishing time to realize simplified polishing. Moreover, the polishing having efficiency and high reliability can be possible by continuously performing the polishing continuously with excellent polishing speed during initial stage, and re-polishing is also excellent. The polishing pads (1, 2) are composed of a high-rigidity thermoplastic hard resin foaming body having a three-dimensional structure, wherein the three-dimensional air chamber structure is formed by a plurality of air chambers and cell walls that partition the cells to enable it to have mutually independent partitioning. The polishing pad is a structural body as following: the mechanical characteristic of the wall part of the cell wall is configured as a value represented by the mechanical characteristic of a resin sheet before foaming, wherein the tensile strength is 50 MPa to 90 MPa, the bending strength is 90 MPa</description><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES</subject><subject>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</subject><subject>GRINDING</subject><subject>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</subject><subject>PERFORMING OPERATIONS</subject><subject>POLISHING</subject><subject>TOOLS FOR GRINDING, BUFFING, OR SHARPENING</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjbsKwkAQRdNYiPoPa28g0UDqIIqlRcAyDNmJO7AvdjeN3-OHugkxsbQaLufcO-vkfTeSvCD9ZBb4gdk5KgzCcNb7IQSBP2g0QX_hZJpu1DwoZChJkYYwYOOYQ963847DdNkKFPVgogKSXrFOykrqCPnycJusOpAed9PdJPvrpT7fUrSmQW-hRY2hqR_HLC_zosyK6vSP8wF_6lbQ</recordid><startdate>20170501</startdate><enddate>20170501</enddate><creator>YAMAMOTO, SHUNJI</creator><creator>MASUDA, MITSUO</creator><creator>YOKOTA, NOBUTOSHI</creator><creator>KUBOTA, TETSUHARU</creator><creator>TODA, SADAYUKI</creator><scope>EVB</scope></search><sort><creationdate>20170501</creationdate><title>Polishing pad, polishing method using the polishing pad, and using method of the same eliminating or reducing the pre-polishing time to realize simplified polishing</title><author>YAMAMOTO, SHUNJI ; MASUDA, MITSUO ; YOKOTA, NOBUTOSHI ; KUBOTA, TETSUHARU ; TODA, SADAYUKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TW201714704A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2017</creationdate><topic>DRESSING OR CONDITIONING OF ABRADING SURFACES</topic><topic>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</topic><topic>GRINDING</topic><topic>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</topic><topic>PERFORMING OPERATIONS</topic><topic>POLISHING</topic><topic>TOOLS FOR GRINDING, BUFFING, OR SHARPENING</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>YAMAMOTO, SHUNJI</creatorcontrib><creatorcontrib>MASUDA, MITSUO</creatorcontrib><creatorcontrib>YOKOTA, NOBUTOSHI</creatorcontrib><creatorcontrib>KUBOTA, TETSUHARU</creatorcontrib><creatorcontrib>TODA, SADAYUKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YAMAMOTO, SHUNJI</au><au>MASUDA, MITSUO</au><au>YOKOTA, NOBUTOSHI</au><au>KUBOTA, TETSUHARU</au><au>TODA, SADAYUKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Polishing pad, polishing method using the polishing pad, and using method of the same eliminating or reducing the pre-polishing time to realize simplified polishing</title><date>2017-05-01</date><risdate>2017</risdate><abstract>Provided is a polishing pad including a resin foaming body composed of thermoplastic resin, capable of eliminating or reducing pre-polishing time to realize simplified polishing. Moreover, the polishing having efficiency and high reliability can be possible by continuously performing the polishing continuously with excellent polishing speed during initial stage, and re-polishing is also excellent. The polishing pads (1, 2) are composed of a high-rigidity thermoplastic hard resin foaming body having a three-dimensional structure, wherein the three-dimensional air chamber structure is formed by a plurality of air chambers and cell walls that partition the cells to enable it to have mutually independent partitioning. The polishing pad is a structural body as following: the mechanical characteristic of the wall part of the cell wall is configured as a value represented by the mechanical characteristic of a resin sheet before foaming, wherein the tensile strength is 50 MPa to 90 MPa, the bending strength is 90 MPa</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language chi ; eng
recordid cdi_epo_espacenet_TW201714704A
source esp@cenet
subjects DRESSING OR CONDITIONING OF ABRADING SURFACES
FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
GRINDING
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
PERFORMING OPERATIONS
POLISHING
TOOLS FOR GRINDING, BUFFING, OR SHARPENING
TRANSPORTING
title Polishing pad, polishing method using the polishing pad, and using method of the same eliminating or reducing the pre-polishing time to realize simplified polishing
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-05T21%3A01%3A07IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=YAMAMOTO,%20SHUNJI&rft.date=2017-05-01&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ETW201714704A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true