A fluid handling structure, a lithographic apparatus and a device manufacturing method
A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially o...
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| creator | VAN DER HAM, RONALD VAN DER ZANDEN, FREDERIK ANTONIUS GATTOBIGIO, GIOVANNI LUCA ROPS, CORNELIUS MARIA BESSEMS, DAVID BLANCO CARBALLO, VICTOR MANUEL STALS, WALTER THEODORUS MATHEUS EUMMELEN, ERIK HENRICUS EGIDIUS CATHARIN WERNAART, WILHELMUS ANTONIUS |
| description | A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space. |
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| language | chi ; eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PHYSICS SEPARATION TRANSPORTING |
| title | A fluid handling structure, a lithographic apparatus and a device manufacturing method |
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