Plasma processing method and plasma processing apparatus

A plasma processing method including disposing a wafer to be processed on a sample stage disposed in a processing chamber within a vacuum vessel, supplying an electric field using first high frequency power for plasma forming into the processing chamber and forming plasma, and supplying second high...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	TERAUCHI, HIROMITSU, IIDA, TSUTOMU, OOHIRABARU, YUUZOU
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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