Virtual metrology system and method

A virtual metrology system and a method therefor are provided herein. In the system, data of equipment tool conditions is gathered and clustered according to a plurality of predetermined patterns. The clustered data is calculated according to the corresponding pattern and a comparing result is obtai...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HSIEH, CHING-HSING, CHUNG, FENGI, LIN, YIUN, YU, CHIENUAN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY CONTROL OR REGULATING SYSTEMS IN GENERAL CONTROLLING ELECTROGRAPHY FUNCTIONAL ELEMENTS OF SUCH SYSTEMS HOLOGRAPHY MATERIALS THEREFOR MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS REGULATING
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