Virtual metrology system and method
A virtual metrology system and a method therefor are provided herein. In the system, data of equipment tool conditions is gathered and clustered according to a plurality of predetermined patterns. The clustered data is calculated according to the corresponding pattern and a comparing result is obtai...
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creator | HSIEH, CHING-HSING CHUNG, FENGI LIN, YIUN YU, CHIENUAN |
description | A virtual metrology system and a method therefor are provided herein. In the system, data of equipment tool conditions is gathered and clustered according to a plurality of predetermined patterns. The clustered data is calculated according to the corresponding pattern and a comparing result is obtained therefrom. If the result obtained meets a desired output, a corresponding process will be performed based on the result. In one case, the corresponding process is performing a normal sampling process if the clustered data meets the corresponding pattern. If the clustered data does not meet the corresponding pattern, an alarm will be generated thereby and the corresponding equipment may be shut down. In another case, the corresponding process is performing an equipment maintaining process if the clustered data meets the corresponding pattern. |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TW201606469A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TW201606469A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TW201606469A3</originalsourceid><addsrcrecordid>eNrjZFAOyywqKU3MUchNLSnKz8lPr1QoriwuSc1VSMxLAQlm5KfwMLCmJeYUp_JCaW4GRTfXEGcP3dSC_PjU4oLE5NS81JL4kHAjA0MzAzMTM0tHY2LUAAAHQybk</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Virtual metrology system and method</title><source>esp@cenet</source><creator>HSIEH, CHING-HSING ; CHUNG, FENGI ; LIN, YIUN ; YU, CHIENUAN</creator><creatorcontrib>HSIEH, CHING-HSING ; CHUNG, FENGI ; LIN, YIUN ; YU, CHIENUAN</creatorcontrib><description>A virtual metrology system and a method therefor are provided herein. In the system, data of equipment tool conditions is gathered and clustered according to a plurality of predetermined patterns. The clustered data is calculated according to the corresponding pattern and a comparing result is obtained therefrom. If the result obtained meets a desired output, a corresponding process will be performed based on the result. In one case, the corresponding process is performing a normal sampling process if the clustered data meets the corresponding pattern. If the clustered data does not meet the corresponding pattern, an alarm will be generated thereby and the corresponding equipment may be shut down. In another case, the corresponding process is performing an equipment maintaining process if the clustered data meets the corresponding pattern.</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; CONTROL OR REGULATING SYSTEMS IN GENERAL ; CONTROLLING ; ELECTROGRAPHY ; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS ; HOLOGRAPHY ; MATERIALS THEREFOR ; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; REGULATING</subject><creationdate>2016</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160216&DB=EPODOC&CC=TW&NR=201606469A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160216&DB=EPODOC&CC=TW&NR=201606469A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HSIEH, CHING-HSING</creatorcontrib><creatorcontrib>CHUNG, FENGI</creatorcontrib><creatorcontrib>LIN, YIUN</creatorcontrib><creatorcontrib>YU, CHIENUAN</creatorcontrib><title>Virtual metrology system and method</title><description>A virtual metrology system and a method therefor are provided herein. In the system, data of equipment tool conditions is gathered and clustered according to a plurality of predetermined patterns. The clustered data is calculated according to the corresponding pattern and a comparing result is obtained therefrom. If the result obtained meets a desired output, a corresponding process will be performed based on the result. In one case, the corresponding process is performing a normal sampling process if the clustered data meets the corresponding pattern. If the clustered data does not meet the corresponding pattern, an alarm will be generated thereby and the corresponding equipment may be shut down. In another case, the corresponding process is performing an equipment maintaining process if the clustered data meets the corresponding pattern.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>CONTROL OR REGULATING SYSTEMS IN GENERAL</subject><subject>CONTROLLING</subject><subject>ELECTROGRAPHY</subject><subject>FUNCTIONAL ELEMENTS OF SUCH SYSTEMS</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>REGULATING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2016</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFAOyywqKU3MUchNLSnKz8lPr1QoriwuSc1VSMxLAQlm5KfwMLCmJeYUp_JCaW4GRTfXEGcP3dSC_PjU4oLE5NS81JL4kHAjA0MzAzMTM0tHY2LUAAAHQybk</recordid><startdate>20160216</startdate><enddate>20160216</enddate><creator>HSIEH, CHING-HSING</creator><creator>CHUNG, FENGI</creator><creator>LIN, YIUN</creator><creator>YU, CHIENUAN</creator><scope>EVB</scope></search><sort><creationdate>20160216</creationdate><title>Virtual metrology system and method</title><author>HSIEH, CHING-HSING ; CHUNG, FENGI ; LIN, YIUN ; YU, CHIENUAN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TW201606469A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2016</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>CONTROL OR REGULATING SYSTEMS IN GENERAL</topic><topic>CONTROLLING</topic><topic>ELECTROGRAPHY</topic><topic>FUNCTIONAL ELEMENTS OF SUCH SYSTEMS</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>REGULATING</topic><toplevel>online_resources</toplevel><creatorcontrib>HSIEH, CHING-HSING</creatorcontrib><creatorcontrib>CHUNG, FENGI</creatorcontrib><creatorcontrib>LIN, YIUN</creatorcontrib><creatorcontrib>YU, CHIENUAN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HSIEH, CHING-HSING</au><au>CHUNG, FENGI</au><au>LIN, YIUN</au><au>YU, CHIENUAN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Virtual metrology system and method</title><date>2016-02-16</date><risdate>2016</risdate><abstract>A virtual metrology system and a method therefor are provided herein. In the system, data of equipment tool conditions is gathered and clustered according to a plurality of predetermined patterns. The clustered data is calculated according to the corresponding pattern and a comparing result is obtained therefrom. If the result obtained meets a desired output, a corresponding process will be performed based on the result. In one case, the corresponding process is performing a normal sampling process if the clustered data meets the corresponding pattern. If the clustered data does not meet the corresponding pattern, an alarm will be generated thereby and the corresponding equipment may be shut down. In another case, the corresponding process is performing an equipment maintaining process if the clustered data meets the corresponding pattern.</abstract><oa>free_for_read</oa></addata></record> |
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language | chi ; eng |
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subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY CONTROL OR REGULATING SYSTEMS IN GENERAL CONTROLLING ELECTROGRAPHY FUNCTIONAL ELEMENTS OF SUCH SYSTEMS HOLOGRAPHY MATERIALS THEREFOR MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS REGULATING |
title | Virtual metrology system and method |
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