Device for depositing nanotubes
The invention relates to a device for depositing carbonaceous structures, for example layers in the form of nanotubes or graphene on a substrate (6), which is supported by a substrate support (1) disposed in a process chamber housing (19), wherein a process gas can be fed in the direction onto the a...
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| creator | JOUVRAY, ALEXANDRE TEO, KENNETH RUPESINGHE, NALIN RIPPINGTON, DAVID ERIC |
| description | The invention relates to a device for depositing carbonaceous structures, for example layers in the form of nanotubes or graphene on a substrate (6), which is supported by a substrate support (1) disposed in a process chamber housing (19), wherein a process gas can be fed in the direction onto the at least one substrate (6) through gas outlet openings (39) of a gas inlet element (24, 25) disposed in the process chamber housing (19). As a functionally advantageous modification, according to the invention, the process chamber housing (19) has two opposing walls (48, 48') which have holding recesses (34, 35, 36, 37, 38). At least one plate-shaped component (24, 25, 26, 30, 31) is disposed in the process chamber housing (19), which plate-shaped component has to two edge portions directed away from one another that each are inserted respectively in a holding recess (34 to 38) of one of the two walls (48, 48'). |
| format | Patent |
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As a functionally advantageous modification, according to the invention, the process chamber housing (19) has two opposing walls (48, 48') which have holding recesses (34, 35, 36, 37, 38). At least one plate-shaped component (24, 25, 26, 30, 31) is disposed in the process chamber housing (19), which plate-shaped component has to two edge portions directed away from one another that each are inserted respectively in a holding recess (34 to 38) of one of the two walls (48, 48').</description><language>chi ; eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2016</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160101&DB=EPODOC&CC=TW&NR=201600632A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160101&DB=EPODOC&CC=TW&NR=201600632A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>JOUVRAY, ALEXANDRE</creatorcontrib><creatorcontrib>TEO, KENNETH</creatorcontrib><creatorcontrib>RUPESINGHE, NALIN</creatorcontrib><creatorcontrib>RIPPINGTON, DAVID ERIC</creatorcontrib><title>Device for depositing nanotubes</title><description>The invention relates to a device for depositing carbonaceous structures, for example layers in the form of nanotubes or graphene on a substrate (6), which is supported by a substrate support (1) disposed in a process chamber housing (19), wherein a process gas can be fed in the direction onto the at least one substrate (6) through gas outlet openings (39) of a gas inlet element (24, 25) disposed in the process chamber housing (19). As a functionally advantageous modification, according to the invention, the process chamber housing (19) has two opposing walls (48, 48') which have holding recesses (34, 35, 36, 37, 38). At least one plate-shaped component (24, 25, 26, 30, 31) is disposed in the process chamber housing (19), which plate-shaped component has to two edge portions directed away from one another that each are inserted respectively in a holding recess (34 to 38) of one of the two walls (48, 48').</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2016</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJB3SS3LTE5VSMsvUkhJLcgvzizJzEtXyEvMyy8pTUot5mFgTUvMKU7lhdLcDIpuriHOHrpAtfGpxQWJyal5qSXxIeFGBoZmBgZmxkaOxsSoAQAzSSUe</recordid><startdate>20160101</startdate><enddate>20160101</enddate><creator>JOUVRAY, ALEXANDRE</creator><creator>TEO, KENNETH</creator><creator>RUPESINGHE, NALIN</creator><creator>RIPPINGTON, DAVID ERIC</creator><scope>EVB</scope></search><sort><creationdate>20160101</creationdate><title>Device for depositing nanotubes</title><author>JOUVRAY, ALEXANDRE ; TEO, KENNETH ; RUPESINGHE, NALIN ; RIPPINGTON, DAVID ERIC</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TW201600632A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2016</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>JOUVRAY, ALEXANDRE</creatorcontrib><creatorcontrib>TEO, KENNETH</creatorcontrib><creatorcontrib>RUPESINGHE, NALIN</creatorcontrib><creatorcontrib>RIPPINGTON, DAVID ERIC</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>JOUVRAY, ALEXANDRE</au><au>TEO, KENNETH</au><au>RUPESINGHE, NALIN</au><au>RIPPINGTON, DAVID ERIC</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Device for depositing nanotubes</title><date>2016-01-01</date><risdate>2016</risdate><abstract>The invention relates to a device for depositing carbonaceous structures, for example layers in the form of nanotubes or graphene on a substrate (6), which is supported by a substrate support (1) disposed in a process chamber housing (19), wherein a process gas can be fed in the direction onto the at least one substrate (6) through gas outlet openings (39) of a gas inlet element (24, 25) disposed in the process chamber housing (19). As a functionally advantageous modification, according to the invention, the process chamber housing (19) has two opposing walls (48, 48') which have holding recesses (34, 35, 36, 37, 38). At least one plate-shaped component (24, 25, 26, 30, 31) is disposed in the process chamber housing (19), which plate-shaped component has to two edge portions directed away from one another that each are inserted respectively in a holding recess (34 to 38) of one of the two walls (48, 48').</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | Device for depositing nanotubes |
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