Compound, photosensitive resin composition including the same, and color filter manufactured using the photosensitive resin composition
Disclosed is a compound represented by the following Chemical Formula 1. In the above Chemical Formula 1, each substituent is the same as defined in the detailed description.
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| creator | SHIN, MYOUNG-YOUP BERBERICH, MARTIN PLUEG, CARSTEN |
| description | Disclosed is a compound represented by the following Chemical Formula 1. In the above Chemical Formula 1, each substituent is the same as defined in the detailed description. |
| format | Patent |
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| language | chi ; eng |
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| subjects | ADHESIVES APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS DYES ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY LAKES MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS MORDANTS NATURAL RESINS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORGANIC CHEMISTRY ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PAINTS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS POLISHES THEIR PREPARATION OR CHEMICAL WORKING-UP |
| title | Compound, photosensitive resin composition including the same, and color filter manufactured using the photosensitive resin composition |
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