Surface correction of mirrors with decoupling coating

The invention relates to a mirror (1) for EUV lithography, comprising a substrate (2) and a reflective coating (3, 4), wherein the reflective coating comprises a first group (3) of layers (3a, 3b) and a second group (4) of layers (4a, 4b), wherein the first group (3) and second group (4) of layers (...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LORING, ULRICH, RENNON, SIEGFRIED, ASSMUS, TILMANN, MULLER, JURGEN, HACKL, TOBIAS, DIER, OLIVER, STICKEL, FRANZ-JOSEF, KAMENOV, VLADIMIR
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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