Dense oxide coated component of a plasma processing chamber and method of manufacture thereof
A method of forming a dense oxide coating on an aluminum component of semiconductor processing equipment comprises cold spraying a layer of pure aluminum on a surface of the aluminum component to a predetermined thickness. A dense oxide coating is then formed on the layer of pure aluminum using a pl...
Gespeichert in:
| Hauptverfasser: | , , , , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | chi ; eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | RAMANATHAN, SIVAKAMI SHIH, HONG STEVENSON, TOM KERNS, JOHN MICHAEL XU, LIN CHARLES, WILLIAM O'NEILL, ROBERT G DAUGHERTY, JOHN ORMOND, RUSSELL |
| description | A method of forming a dense oxide coating on an aluminum component of semiconductor processing equipment comprises cold spraying a layer of pure aluminum on a surface of the aluminum component to a predetermined thickness. A dense oxide coating is then formed on the layer of pure aluminum using a plasma electrolytic oxidation process, wherein the plasma electrolytic oxidation process causes the layer of pure aluminum to undergo microplasmic discharges, thus forming the dense oxide coating on the layer of pure aluminum on the surface of the aluminum component. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TW201504479A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TW201504479A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TW201504479A3</originalsourceid><addsrcrecordid>eNqNyk0KwjAQBtBuXIh6h_EAQtWKuBR_8AAFV1LG5IstNDMhScHjW8EDuHqbNy0eZ0gC6buzIKOcYUd8UIFkUkdMoefkR6IapNTJi0zL_olILJY8cqv2Oz3L4NjkIYJyiwh182LiuE9Y_JwVy-ulPt1WCNogBTYQ5Ka-b8r1rqyq_eG4_ed8ANZkPDc</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Dense oxide coated component of a plasma processing chamber and method of manufacture thereof</title><source>esp@cenet</source><creator>RAMANATHAN, SIVAKAMI ; SHIH, HONG ; STEVENSON, TOM ; KERNS, JOHN MICHAEL ; XU, LIN ; CHARLES, WILLIAM ; O'NEILL, ROBERT G ; DAUGHERTY, JOHN ; ORMOND, RUSSELL</creator><creatorcontrib>RAMANATHAN, SIVAKAMI ; SHIH, HONG ; STEVENSON, TOM ; KERNS, JOHN MICHAEL ; XU, LIN ; CHARLES, WILLIAM ; O'NEILL, ROBERT G ; DAUGHERTY, JOHN ; ORMOND, RUSSELL</creatorcontrib><description>A method of forming a dense oxide coating on an aluminum component of semiconductor processing equipment comprises cold spraying a layer of pure aluminum on a surface of the aluminum component to a predetermined thickness. A dense oxide coating is then formed on the layer of pure aluminum using a plasma electrolytic oxidation process, wherein the plasma electrolytic oxidation process causes the layer of pure aluminum to undergo microplasmic discharges, thus forming the dense oxide coating on the layer of pure aluminum on the surface of the aluminum component.</description><language>chi ; eng</language><subject>APPARATUS THEREFOR ; BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROFORMING ; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS ; SEMICONDUCTOR DEVICES ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150201&DB=EPODOC&CC=TW&NR=201504479A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150201&DB=EPODOC&CC=TW&NR=201504479A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>RAMANATHAN, SIVAKAMI</creatorcontrib><creatorcontrib>SHIH, HONG</creatorcontrib><creatorcontrib>STEVENSON, TOM</creatorcontrib><creatorcontrib>KERNS, JOHN MICHAEL</creatorcontrib><creatorcontrib>XU, LIN</creatorcontrib><creatorcontrib>CHARLES, WILLIAM</creatorcontrib><creatorcontrib>O'NEILL, ROBERT G</creatorcontrib><creatorcontrib>DAUGHERTY, JOHN</creatorcontrib><creatorcontrib>ORMOND, RUSSELL</creatorcontrib><title>Dense oxide coated component of a plasma processing chamber and method of manufacture thereof</title><description>A method of forming a dense oxide coating on an aluminum component of semiconductor processing equipment comprises cold spraying a layer of pure aluminum on a surface of the aluminum component to a predetermined thickness. A dense oxide coating is then formed on the layer of pure aluminum using a plasma electrolytic oxidation process, wherein the plasma electrolytic oxidation process causes the layer of pure aluminum to undergo microplasmic discharges, thus forming the dense oxide coating on the layer of pure aluminum on the surface of the aluminum component.</description><subject>APPARATUS THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROFORMING</subject><subject>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2015</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyk0KwjAQBtBuXIh6h_EAQtWKuBR_8AAFV1LG5IstNDMhScHjW8EDuHqbNy0eZ0gC6buzIKOcYUd8UIFkUkdMoefkR6IapNTJi0zL_olILJY8cqv2Oz3L4NjkIYJyiwh182LiuE9Y_JwVy-ulPt1WCNogBTYQ5Ka-b8r1rqyq_eG4_ed8ANZkPDc</recordid><startdate>20150201</startdate><enddate>20150201</enddate><creator>RAMANATHAN, SIVAKAMI</creator><creator>SHIH, HONG</creator><creator>STEVENSON, TOM</creator><creator>KERNS, JOHN MICHAEL</creator><creator>XU, LIN</creator><creator>CHARLES, WILLIAM</creator><creator>O'NEILL, ROBERT G</creator><creator>DAUGHERTY, JOHN</creator><creator>ORMOND, RUSSELL</creator><scope>EVB</scope></search><sort><creationdate>20150201</creationdate><title>Dense oxide coated component of a plasma processing chamber and method of manufacture thereof</title><author>RAMANATHAN, SIVAKAMI ; SHIH, HONG ; STEVENSON, TOM ; KERNS, JOHN MICHAEL ; XU, LIN ; CHARLES, WILLIAM ; O'NEILL, ROBERT G ; DAUGHERTY, JOHN ; ORMOND, RUSSELL</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TW201504479A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2015</creationdate><topic>APPARATUS THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROFORMING</topic><topic>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>RAMANATHAN, SIVAKAMI</creatorcontrib><creatorcontrib>SHIH, HONG</creatorcontrib><creatorcontrib>STEVENSON, TOM</creatorcontrib><creatorcontrib>KERNS, JOHN MICHAEL</creatorcontrib><creatorcontrib>XU, LIN</creatorcontrib><creatorcontrib>CHARLES, WILLIAM</creatorcontrib><creatorcontrib>O'NEILL, ROBERT G</creatorcontrib><creatorcontrib>DAUGHERTY, JOHN</creatorcontrib><creatorcontrib>ORMOND, RUSSELL</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>RAMANATHAN, SIVAKAMI</au><au>SHIH, HONG</au><au>STEVENSON, TOM</au><au>KERNS, JOHN MICHAEL</au><au>XU, LIN</au><au>CHARLES, WILLIAM</au><au>O'NEILL, ROBERT G</au><au>DAUGHERTY, JOHN</au><au>ORMOND, RUSSELL</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Dense oxide coated component of a plasma processing chamber and method of manufacture thereof</title><date>2015-02-01</date><risdate>2015</risdate><abstract>A method of forming a dense oxide coating on an aluminum component of semiconductor processing equipment comprises cold spraying a layer of pure aluminum on a surface of the aluminum component to a predetermined thickness. A dense oxide coating is then formed on the layer of pure aluminum using a plasma electrolytic oxidation process, wherein the plasma electrolytic oxidation process causes the layer of pure aluminum to undergo microplasmic discharges, thus forming the dense oxide coating on the layer of pure aluminum on the surface of the aluminum component.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | chi ; eng |
| recordid | cdi_epo_espacenet_TW201504479A |
| source | esp@cenet |
| subjects | APPARATUS THEREFOR BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | Dense oxide coated component of a plasma processing chamber and method of manufacture thereof |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-04T04%3A53%3A53IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=RAMANATHAN,%20SIVAKAMI&rft.date=2015-02-01&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ETW201504479A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |