Method for processing substrate

Techniques for processing a substrate are disclosed. In one exemplary embodiment, the technique may be realized as a method for processing a substrate, the method comprising: ionizing first material and second material in an ion source chamber of an ion source, the first material being boron (B) con...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	WHITE, RICHARD M, DANIELS, KEVIN M, KOO, BON-WOONG, RADOVANOV, SVETLANA B, COBB, ERIC R, PITMAN, DAVID W
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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